Strained single-crystal Al2O3 grown layer by layer on Nb (110) thin films

被引:9
|
作者
Welander, Paul B.
Eckstein, James N. [1 ]
机构
[1] Univ Illinois, Dept Phys, Urbana, IL 61801 USA
[2] Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.2747675
中图分类号
O59 [应用物理学];
学科分类号
摘要
The authors report on the growth of single-crystal Al2O3 thin films on Nb (110) surfaces. Niobium is grown on alpha-Al2O3 (11 (2) over bar0), followed by the evaporation of Al in an O-2 background. Initially, Al2O3 grows layer by layer with hexagonal symmetry indicating either alpha-Al2O3 (0001) or gamma-Al2O3 (111). Diffraction measurements show that the Al2O3 initially grows clamped to the Nb with tensile strain near 10%. This strain relaxes with further deposition and beyond about 50 angstrom, the authors observe island growth. Despite the asymmetric misfit between Al2O3 and Nb, the strain is surprisingly isotropic. Josephson junctions employing epitaxial Al2O3 show low effective tunnel barriers and high leakage currents. (c) 2007 American Institute of Physics.
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页数:3
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