Strained single-crystal Al2O3 grown layer by layer on Nb (110) thin films

被引:9
|
作者
Welander, Paul B.
Eckstein, James N. [1 ]
机构
[1] Univ Illinois, Dept Phys, Urbana, IL 61801 USA
[2] Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.2747675
中图分类号
O59 [应用物理学];
学科分类号
摘要
The authors report on the growth of single-crystal Al2O3 thin films on Nb (110) surfaces. Niobium is grown on alpha-Al2O3 (11 (2) over bar0), followed by the evaporation of Al in an O-2 background. Initially, Al2O3 grows layer by layer with hexagonal symmetry indicating either alpha-Al2O3 (0001) or gamma-Al2O3 (111). Diffraction measurements show that the Al2O3 initially grows clamped to the Nb with tensile strain near 10%. This strain relaxes with further deposition and beyond about 50 angstrom, the authors observe island growth. Despite the asymmetric misfit between Al2O3 and Nb, the strain is surprisingly isotropic. Josephson junctions employing epitaxial Al2O3 show low effective tunnel barriers and high leakage currents. (c) 2007 American Institute of Physics.
引用
收藏
页数:3
相关论文
共 50 条
  • [41] Permeation measurements and modeling of highly defective Al2O3 thin films grown by atomic layer deposition on polymers
    Carcia, P. F.
    McLean, R. S.
    Reilly, M. H.
    APPLIED PHYSICS LETTERS, 2010, 97 (22)
  • [42] Excellent insulating behavior Al2O3 thin films grown by atomic layer deposition efficiently at room temperature
    Shen, Yude
    Li, Yawei
    Zhang, Jinzhong
    Zhu, Xia
    Hu, Zhigao
    Chu, Junhao
    OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS, 2012, 6 (5-6): : 618 - 622
  • [43] High quality graphene grown on single-crystal Mo(110) thin films
    Wang, Bin
    Zhang, Yanhui
    Chen, Zhiying
    Wu, Yuanwen
    Jin, Zhi
    Liu, Xinyu
    Hu, Lizhong
    Yu, Guanghui
    MATERIALS LETTERS, 2013, 93 : 165 - 168
  • [44] Low-Temperature Atomic Layer Deposition of α-Al2O3 Thin Films
    Aarik, Lauri
    Mandar, Hugo
    Ritslaid, Peeter
    Tarre, Aivar
    Kozlova, Jekaterina
    Aarik, Jaan
    CRYSTAL GROWTH & DESIGN, 2021, 21 (07) : 4220 - 4229
  • [45] Chemical and structural properties of atomic layer deposited La2O3 films capped with a thin Al2O3 layer
    Li, X. L.
    Tsoutsou, D.
    Scarel, G.
    Wiemer, C.
    Capelli, S. C.
    Volkos, S. N.
    Lamagna, L.
    Fanciulli, M.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2009, 27 (02): : L1 - L7
  • [46] Mechanical Properties and the Microstructure of Al2O3/Al/Al2O3 Joints with the Surface Modification of Alumina by a Thin Layer of Ti plus Nb
    Ksiazek, Marzanna
    Tchorz, Adam
    Boron, Lukasz
    JOURNAL OF MATERIALS ENGINEERING AND PERFORMANCE, 2014, 23 (05) : 1635 - 1640
  • [47] β"-Al2O3 single-crystal films and polycrystalline gallates -: structural and optical properties
    Nicholson, PS
    SOLID STATE IONICS, 2001, 143 (01) : 31 - 37
  • [48] Atomic layer deposition of TiO2 and Al2O3 thin films and nanolaminates
    Mitchell, DRG
    Triani, G
    Attard, DJ
    Finnie, KS
    Evans, PJ
    Barbé, CJ
    Bartlett, JR
    SMART MATERIALS AND STRUCTURES, 2006, 15 (01) : S57 - S64
  • [49] Thermal properties of thin Al2O3 films and their barrier layer effect on thermo-optic properties of TiO2 films grown by atomic layer deposition
    Saleem, Muhammad Rizwan
    Ali, Rizwan
    Honkanen, Seppo
    Turunen, Jari
    THIN SOLID FILMS, 2013, 542 : 257 - 262
  • [50] Substrate dependence on the optical properties of Al2O3 films grown by atomic layer deposition
    Kim, Y
    Lee, SM
    Park, CS
    Lee, SI
    Lee, MY
    APPLIED PHYSICS LETTERS, 1997, 71 (25) : 3604 - 3606