Physical and optical properties of sputtered lithium niobate thin films

被引：1
|
作者：
Lu, DX [1 ]
Wong, EMW [1 ]
Pun, EYB [1 ]
Chung, PS [1 ]
机构：
[1] CITY UNIV HONG KONG,DEPT ELECT ENGN,OPTOELECT RES CTR,KOWLOON,HONG KONG
来源：
ELECTRO-OPTIC AND SECOND HARMONIC GENERATION MATERIALS, DEVICES, AND APPLICATIONS | 1996年 / 2897卷
关键词：
rf magnetron sputtering; LiNbO3 thin films; crystalline structure; transmittance;
D O I：
10.1117/12.252926
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
下载
收藏
页码：361 / 368
页数：4
相关论文
共 50 条
  • [41] Post-Annealing Effects on the Physical and Optical Waveguiding Properties of RF Sputtered ZnO Thin Films
    Meriche, Faiza
    Touam, Tahar
    Chelouche, Azeddine
    Dehimi, Mohamed
    Solard, Jeanne
    Fischer, Alexis
    Boudrioua, Azzedine
    Peng, Lung-Han
    ELECTRONIC MATERIALS LETTERS, 2015, 11 (05) : 862 - 870
  • [42] Physical properties of reactive RF sputtered a-IZON thin films
    Ortega, J. J.
    Escobedo-Galvan, C. R.
    Avelar-Munoz, F.
    Ortiz-Hernandez, A. A.
    Tototzintle-Huitle, H.
    Falcony, C.
    Araiza, J. J.
    REVISTA MEXICANA DE FISICA, 2019, 65 (02) : 133 - 138
  • [43] DEPOSITION AND PHYSICAL CHARACTERIZATION OF THIN-FILMS OF LITHIUM-NIOBATE ON SILICON SUBSTRATES
    BAUMANN, RC
    ROST, TA
    RABSON, TA
    JOURNAL OF APPLIED PHYSICS, 1990, 68 (06) : 2989 - 2992
  • [44] Impact of samarium on the structural and physical properties of sputtered ZnO thin films
    Aida, M. S.
    Abdel-wahab, M. Sh
    Hammad, Ahmed H.
    OPTIK, 2022, 250
  • [45] Physical properties of reactive sputtered tin-nitride thin films
    Inoue, Y
    Nomiya, N
    Takai, O
    VACUUM, 1998, 51 (04) : 673 - 676
  • [46] Physical properties of RF sputtered ITO thin films and annealing effect
    Kerkache, L
    Layadi, A
    Dogheche, E
    Rémiens, D
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2006, 39 (01) : 184 - 189
  • [47] Role of oxygen contaminant on the physical properties of sputtered AlN thin films
    Signore, M. A.
    Taurino, A.
    Valerini, D.
    Rizzo, A.
    Farella, I.
    Catalano, M.
    Quaranta, F.
    Siciliano, P.
    JOURNAL OF ALLOYS AND COMPOUNDS, 2015, 649 : 1267 - 1272
  • [48] Role of oxygen contaminant on the physical properties of sputtered AlN thin films
    Taurino, A. (antonietta.taurino@le.imm.cnr.it), 1600, Elsevier Ltd (649):
  • [49] Fabrication and physical properties of radio frequency sputtered ZnMnSe thin films
    Tsai, CT
    Chuu, DS
    Leou, JY
    Chou, WC
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (7A): : 4427 - 4430
  • [50] Physical properties of sputtered ITO and WO3 thin films
    Cui, HN
    Teixeira, V
    Monteiro, A
    Fortunato, E
    Martins, R
    Bertran, E
    ADVANCED MATERIALS FORUM II, 2004, 455-456 : 7 - 11
12345