LVTSCR structures for latch-up free ESD protection of BiCMOS RF circuits

被引:11
|
作者
Vashchenko, V [1 ]
Concannon, A [1 ]
ter Beek, M [1 ]
Hopper, P [1 ]
机构
[1] NSC, Santa Clara, CA 95052 USA
关键词
D O I
10.1016/S0026-2714(02)00125-7
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The results of a numerical and experimental study aimed at increasing the holding on-state voltage of a low-voltage triggered silicon controlled rectifier are presented. Using TCAD numerical simulations two solutions are presented that are based on emitter injection control by the modification of the emitter-drain area ratio and by the addition of internal diodes in the emitter line. Experimental data generated in a 0.18 mum CMOS technology demonstrate the effectiveness of the new low-voltage triggered silicon controlled rectifier (LVTSCR) structures and validates the simulation results. It has been demonstrated that for the LVTSCR structures with high holding voltage the electrostatic discharge efficiency is 3-5 times higher than that of a conventional grounded gate snapback NMOS and simultaneously has 50% lower RF load capacitance. (C) 2002 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:61 / 69
页数:9
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