Intrinsic mismatch between floating-gate nonvolatile memory cell and equivalent transistor

被引:2
|
作者
Duane, Russell [1 ]
Rafhay, Quentin
Beug, M. Florian
van Duuren, Michiel
机构
[1] Natl Univ Ireland Univ Coll Cork, Tyndall Natl Inst, Cork, Ireland
[2] Inst Microelect Electromagnet & Photon, F-38016 Grenoble, France
[3] Qimonda AG, D-01099 Dresden, Germany
[4] NXP Semicond, B-3001 Louvain, Belgium
关键词
nonvolatile memory devices; plasma charging; test structure;
D O I
10.1109/LED.2007.895434
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The matching performance of nonvolatile memory cells and their equivalent transistors is investigated using a novel matching-performance factor. Extensive measurements on three technologies show that matching pairs can be found, but there is an inherent mobility mismatch between the equivalent transistor and the memory cell. It is suggested that the cause of this mismatch is due to the necessary layout differences between the cell and the equivalent transistor that can cause different levels of plasma-induced damage in the structures.
引用
收藏
页码:440 / 442
页数:3
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