Low temperature solution-processed IGZO thin-film transistors

被引:52
|
作者
Xu, Wangying [1 ]
Hu, Luyao [1 ]
Zhao, Chun [2 ,3 ]
Zhang, Lingjiao [1 ]
Zhu, Deliang [1 ]
Cao, Peijiang [1 ]
Liu, Wenjun [1 ]
Han, Shun [1 ]
Liu, Xinke [1 ]
Jia, Fang [1 ]
Zeng, Yuxiang [1 ]
Lu, Youming [1 ]
机构
[1] Shenzhen Univ, Coll Mat Sci & Engn, Guangdong Res Ctr Interfacial Engn Funct Mat, Shenzhen Key Lab Special Funct Mat, Shenzhen 518060, Peoples R China
[2] Xian Jiaotong Liverpool Univ, Dept Elect & Elect Engn, Suzhou 215123, Peoples R China
[3] Univ Liverpool, Dept Elect Engn & Elect, Liverpool L69 3GJ, Merseyside, England
基金
中国国家自然科学基金;
关键词
Solution-processed; Low-temperature; IGZO; Thin-film transistors; PERFORMANCE OXIDE TRANSISTORS; HIGH-MOBILITY; SEMICONDUCTORS; INGAZNO; ROUTE; GA; FACILE;
D O I
10.1016/j.apsusc.2018.06.005
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We reported the low-temperature high performance IGZO TFTs by solution processing. The influence of IGZO composition over broad range on thin films and devices properties were investigated by a wide range of characterization techniques. The schematic of TFT solution-processed IGZO TFTs mobility with different compositions has been obtained. In order to achieve decent TFT performance, the In content should be much high for solution-processed IGZO TFTs. The optimal solution-processed IGZO TFTs. with In:Ga:Zn = 5:1:1 composition exhibited a large mobility of 9.1 cm (2)V(-)1s-(1),low subthreshold swing of 0.22 V/decade, and high on/off ratio of 10(6) at 300 degrees C processing temperature.
引用
收藏
页码:554 / 560
页数:7
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