Nano/micro-mechanical and tribological characterization of Ar, C, N, and Ne ion-implanted Si

被引：10
|
作者：
Xu, Zhi-Hui [1 ]
Park, Young-Bae [2 ]
Li, Xiaodong [1 ]
机构：
[1] Univ S Carolina, Dept Mech Engn, Columbia, SC 29208 USA
[2] CALTECH, Thomas J Watson Lab Appl Phys, Pasadena, CA 91125 USA
来源：
JOURNAL OF MATERIALS RESEARCH | 2010年 / 25卷 / 05期
基金：
美国国家科学基金会;
关键词：
SILICON; NANOINDENTATION; FILMS; TRANSITION; SURFACES; NITROGEN; MODULUS; WAFERS; CARBON; MODEL;
D O I：
10.1557/JMR.2010.0117
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Ion implantation has been widely used to improve the mechanical and tribological properties of single crystalline silicon, an essential material for the semiconductor industry. In this study. the effects of four different ion implantations, Ar, C, N, and Ne ions, on the mechanical and tribological properties of single crystal Si were investigated at both the nanoscale and the microscale. Nanoindentation and microindentation were used to measure the mechanical properties and fracture toughness of ion-implanted Si. Nano and micro scratch and wear tests were performed to study the tribological behaviors of different ion-implanted Si The relationship between the mechanical properties and tribological behavior and the damage mechanism of scratch and wear were also discussed.
引用
收藏
页码：880 / 889
页数：10
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