Total dose response studies of n-channel SOI MOSFETs for low power CMOS circuits

被引:1
|
作者
Srivastava, A [1 ]
机构
[1] Louisiana State Univ, Dept Elect & Comp Engn, Baton Rouge, LA 70803 USA
关键词
D O I
10.1016/S0026-2714(00)00018-4
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A rad-sensitive sub-threshold model for the partially depleted, SOI n-channel MOSFET, based on existing pre irradiated device models is presented for applications in low power CMOS circuit designs. The model is continuous from sub-threshold to strong inversion regions and includes the radiation-induced oxide trapped charge, interface state charge, floating body effects and associated parasitic such as BJT. To demonstrate the applicability of the model, we have made an attempt to explain the sub-threshold current-voltage characteristics of a typical SOI n-MOSFET under a total dose condition. The calculated shift of sub-threshold characteristics to more negative values with dose with respect to pre-irradiated condition agrees with the experimentally observed behavior reported in the literature. (C) 2000 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:2111 / 2115
页数:5
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