Total dose response studies of n-channel SOI MOSFETs for low power CMOS circuits

被引:1
|
作者
Srivastava, A [1 ]
机构
[1] Louisiana State Univ, Dept Elect & Comp Engn, Baton Rouge, LA 70803 USA
关键词
D O I
10.1016/S0026-2714(00)00018-4
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A rad-sensitive sub-threshold model for the partially depleted, SOI n-channel MOSFET, based on existing pre irradiated device models is presented for applications in low power CMOS circuit designs. The model is continuous from sub-threshold to strong inversion regions and includes the radiation-induced oxide trapped charge, interface state charge, floating body effects and associated parasitic such as BJT. To demonstrate the applicability of the model, we have made an attempt to explain the sub-threshold current-voltage characteristics of a typical SOI n-MOSFET under a total dose condition. The calculated shift of sub-threshold characteristics to more negative values with dose with respect to pre-irradiated condition agrees with the experimentally observed behavior reported in the literature. (C) 2000 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:2111 / 2115
页数:5
相关论文
共 50 条
  • [31] Charged Particle Induced Degradation of Trench Type n-channel Power MOSFETs
    Koga, R.
    Bielat, S.
    George, J.
    2014 IEEE RADIATION EFFECTS DATA WORKSHOP (REDW), 2014,
  • [32] Study of N-channel MOSFETs with an enclosed-gate layout in a 0.18 μm CMOS technology
    Chen, L
    Gingrich, DM
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2005, 52 (04) : 861 - 867
  • [33] Study of n-channel MOSFETs with an enclosed-gate layout in a 0.18 micron CMOS technology
    Chen, L
    Gingrich, DM
    2004 IEEE NUCLEAR SCIENCE SYMPOSIUM CONFERENCE RECORD, VOLS 1-7, 2004, : 1344 - 1348
  • [34] SIMULATION OF N-CHANNEL FIELD-EFFECT TRANSISTORS IN CIRCUIT ANALYSIS OF CMOS CIRCUITS
    MERCHANT, K
    NACHRICHTENTECHNISCHE ZEITSCHRIFT, 1975, 28 (04): : 133 - 137
  • [35] GaN Silicon-on-Insulator (SOI) N-Channel FinFET for High-Performance Low Power Applications
    Kumar, Ajay
    Tripathi, Shrey Kumar
    Gupta, Neha
    Tripathi, Pranav Mani
    Chaujar, Rishu
    2019 IEEE 14TH NANOTECHNOLOGY MATERIALS AND DEVICES CONFERENCE (NMDC), 2019,
  • [36] ANOMALOUS VOLTAGE OVERSHOOT DURING TURN-OFF OF THIN-FILM N-CHANNEL SOI MOSFETS
    DUBOIS, E
    SHAHIDI, GG
    SCHEUERMANN, MR
    IEEE ELECTRON DEVICE LETTERS, 1993, 14 (04) : 164 - 166
  • [37] Simulation aided hardening of N-channel power MOSFETs to prevent single event burnout
    Dachs, C
    Roubaud, F
    Palau, JM
    Bruguier, G
    Gasiot, J
    Tastet, P
    Calvet, MC
    Calvel, P
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1995, 42 (06) : 1935 - 1939
  • [38] The role of the buried oxide in the hot-carrier degradation of ultra thin n-channel SOI-MOSFETs
    Huttner, T
    Mahnkopf, R
    Wurzer, H
    Biebl, M
    Abstreiter, G
    PROCEEDINGS OF THE EIGHTH INTERNATIONAL SYMPOSIUM ON SILICON-ON-INSULATOR TECHNOLOGY AND DEVICES, 1997, 97 (23): : 277 - 282
  • [39] TEMPERATURE-DEPENDENCE OF SINGLE-EVENT BURNOUT IN N-CHANNEL POWER MOSFETS
    JOHNSON, GH
    SCHRIMPF, RD
    GALLOWAY, KF
    KOGA, R
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1992, 39 (06) : 1605 - 1612
  • [40] INVESTIGATION OF POSSIBLE SOURCES OF 1/F NOISE IN IRRADIATED N-CHANNEL POWER MOSFETS
    PLOOR, MD
    SCHRIMPF, RD
    GALLOWAY, KF
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1994, 41 (06) : 1902 - 1906