An energy method to analyze through thickness thin film fracture during indentation

被引:15
|
作者
Morasch, K. R. [1 ]
Bahr, D. F. [1 ]
机构
[1] Washington State Univ, Pullman, WA 99164 USA
关键词
thin films; fracture; energy;
D O I
10.1016/j.tsf.2006.01.043
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Nanoindentation was utilized to induce fracture of brittle thin oxide films on compliant substrates. The energies were calculated from integrating the resulting load-depth curves from indentation. The total energy applied to the system is a superposition of the energy to deform the substrate and the energy to fracture the film. The applied energy to deform the compliant substrate was separated from the energy applied to the film/substrate system resulting in the energy to fracture the film. The energy for fracture was then converted to a crack extension force and a stress intensity using linear elastic fracture mechanics. The toughness of thermally grown aluminum oxides is between 0.37 and 0.83 MPa m(0.5) and tends to decrease as film thickness increases over the range of 25 to 63 nm. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:3298 / 3304
页数:7
相关论文
共 50 条
  • [31] Measuring thin film fracture toughness using the indentation sinking-in effect and focused ion beam
    Tsui, TY
    Joo, YC
    THIN FILMS-STRESSES AND MECHANICAL PROPERTIES VIII, 2000, 594 : 389 - 394
  • [32] Multilayer thin film thickness measurement using sensitivity separation method
    Gong, Xing-zhi
    Cheng, Liang
    Yu, Fei-hong
    OPTICS COMMUNICATIONS, 2010, 283 (20) : 3989 - 3993
  • [33] Study on a method of the thickness measurement of ultra-thin PtSi film
    Liu, S
    Ning, YG
    Zhang, Y
    Zhang, HW
    Ai, C
    Liu, JG
    Yang, JD
    Li, K
    ACTA PHYSICA SINICA, 2001, 50 (08) : 1447 - 1450
  • [34] A NEW METHOD FOR THIN-FILM THICKNESS MEASUREMENT USING PIXE
    MIRANDA, J
    OLIVER, A
    MONTENEGRO, EC
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1989, 43 (02): : 203 - 209
  • [35] POSSIBILITIES AND LIMITATIONS OF STYLUS METHOD FOR THIN-FILM THICKNESS MEASUREMENTS
    ESCHBACH, HL
    VERHEYEN, F
    THIN SOLID FILMS, 1974, 21 (02) : 237 - 243
  • [36] Study on multi-wavelength thin film thickness determination method
    Shi, Ce
    Xie, Mao-Bin
    Zheng, Wei-Bo
    Ji, Ruo-Nan
    Wang, Shao-Wei
    Lu, Wei
    JOURNAL OF INFRARED AND MILLIMETER WAVES, 2024, 43 (06) : 813 - 819
  • [39] NEW CRYSTAL MOUNTING METHOD FOR THIN-FILM THICKNESS MONITOR
    MATSUZAWA, H
    KAMIRYO, K
    KANO, T
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1975, 14 (03) : 341 - 344
  • [40] Method to measurement of the thin film thickness based on Digital Moire technique
    Su Jun-hong
    Liu Yi-chen
    6TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: OPTICAL TEST AND MEASUREMENT TECHNOLOGY AND EQUIPMENT, 2012, 8417