Study on multi-wavelength thin film thickness determination method

This work introduces a novel method for measuring thin film thickness, employing a multi-wavelength method that significantly reduces the need for broad-spectrum data. Unlike traditional techniques that require several hundred spectral data points, the multi-wavelength method achieves precise thickness measurements with data from only 10 wavelengths. This innovation not only simplifies the process of spectral measurement analysis but also enables accurate real-time thickness measurement on industrial coating production lines. The method effectively reconstructs and fits the visible spectrum (400-800 nm) using a minimal amount of data, while maintaining measurement error within 7. 1%. This advancement lays the foundation for more practical and efficient thin film thickness determination techniques in various industrial applications.