Epitaxial growth of semipolar InN(10(1)over-tilde3) on LaAlO3 substrate: Epitaxial relationship analysis

Epitaxial semipolar InN(10 (1) over tilde3) crystals were grown on a LaAlO3(112) substrate using radio frequency plasma-assisted molecular beam epitaxy without any interlayer. The lattice mismatch between InN and LaAlO3 was estimated to be % 7.75% along the [1 (2) over tilde 10](InN) direction and 0.2% along the [(3) over tilde 032](InN) direction. The InN film is epitaxic with the LaAlO3 substrate, with orientation relationships between InN(10 (1) over tilde3) parallel to LaAlO3(112) and [1 (2) over tilde 10](InN) parallel to [11 (1) over tilde](LAO). InN grown on LaAlO3(112) appears (10 (1) over tilde3) plane orientated, with two types of domains. Semipolar InN(10 (1) over tilde3) layers can be grown at 510 degrees C and show X-ray rocking curve FWHMs of 1830 and 1408 arcsec for InN(0002) and InN(10 (1) over tilde3), respectively. However, InN grown at 510 degrees C has the highest peak intensity and the narrowest FWHM of the prepared samples, indicating high-quality crystal growth. (C) 2017 The Japan Society of Applied Physics