Kelvin test structure for measuring contact resistance of shallow junctions

被引：0

作者：

Nanver, LK ^{[1
]}

Goudena, EJG ^{[1
]}

Slabbekoorn, J ^{[1
]}

机构：

[1] DELFT UNIV TECHNOL,DIMES IC PROC RES SECTOR,NL-2600 GB DELFT,NETHERLANDS

来源：

ICMTS 1996 - 1996 IEEE INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, PROCEEDINGS | 1996年

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：241 / 245

页数：5

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