Effect of Gate Oxide Defects on Tunnel Transistor RF Performance

被引:0
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作者
Hellenbrand, M. [1 ]
Memisevic, E. [1 ]
Svensson, J. [1 ]
Krishnaraja, A. [1 ]
Lind, E. [1 ]
Wernersson, L. -E. [1 ]
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[1] Lund Univ, Dept Elect & Informat Technol, Ole Romers Vag 3, S-22363 Lund, Sweden
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TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页数:2
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