Novel microwave plasma-assisted CVD reactor for diamond delta doping

被引：47

作者：

Vikharev, A. L. ^{[1
]}

Gorbachev, A. M. ^{[1
]}

Lobaev, M. A. ^{[1
]}

Muchnikov, A. B. ^{[1
]}

Radishev, D. B. ^{[1
]}

Isaev, V. A. ^{[1
]}

Chernov, V. V. ^{[1
]}

Bogdanov, S. A. ^{[1
]}

Drozdov, M. N. ^{[2
]}

Butler, J. E. ^{[1
]}

机构：

[1] Russian Acad Sci, Inst Appl Phys, 46 Ulyanov St, Nizhnii Novgorod 603950, Russia

[2] Russian Acad Sci, Inst Phys Microstruct, GSP 105, Nizhnii Novgorod 603950, Russia

来源：

PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS | 2016年 / 10卷 / 04期

关键词：

diamond; single crystals; growth; chemical vapor deposition; reactor; boron; delta doping; secondary ion mass spectroscopy; ION MASS-SPECTROMETRY; DECONVOLUTION; INTERFACES; RESOLUTION; PROFILES; ACCOUNT;

D O I：

10.1002/pssr.201510453

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We report on building a novel chemical vapor deposition (CVD) reactor for diamond delta-doping. The main features of our reactor are: a) the use of rapid gas switching system, (b) the reactor design providing the laminar gas flow. These features provide the creation of ultra-sharp interfaces between doped and undoped material and minimize the prolonged "tails" formation in the doping profile. It is proved by optical emission spectroscopy that gas switching time is not more than 10 seconds. Using the novel reactor we have grown the nanometer-thin layers of boron doped diamond. The FWHM of boron concentration profile is about 2 nm which is proved by SIMS. It is shown that the both single delta-layer and multiple delta-layers could be grown using the novel CVD reactor. In principle, the reactor could be used for diamond delta doping with other dopants, like nitrogen, phosphorus etc. (C) 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

引用

页码：324 / 327

页数：4

共 50 条

[41] Structural Transformation upon Nitrogen Doping of Ultrananocrystalline Diamond Films by Microwave Plasma CVD
Teng, Chien-Chung
Song, Shin-Min
Sung, Chien-Min
Lin, Chhiu-Tsu
JOURNAL OF NANOMATERIALS, 2009, 2009
[42] The Formation of Nanocrystalline Diamond Coating on WC Deposited by Microwave Assisted Plasma CVD
Toff, M. R. M.
Hamzah, E.
Purniawan, A.
INTERNATIONAL CONFERENCE ON ADVANCEMENT OF MATERIALS AND NANOTECHNOLOGY 2007, 2010, 1217 : 500 - +
[43] Deposition of SiC/Si coatings in a microwave plasma-assisted spouted bed reactor
van Laar, J. H.
Bissett, H.
Barry, J. C.
van der Walt, I. J.
Crouse, P. L.
JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 2018, 38 (04) : 1197 - 1209
[44] Hydrogen embrittlement of titanium during microwave plasma assisted CVD diamond deposition
Fu, YQ
Yan, B
Loh, NL
Sun, CQ
Hing, P
SURFACE ENGINEERING, 2000, 16 (04) : 349 - 354
[45] CVD diamond with boron-doped delta-layers deposited by microwave plasma
Vikharev, A. L.
Gorbachev, A. M.
Lobaev, M. A.
Radishev, D. B.
Isaev, V. A.
Bogdanov, S. A.
Drozdov, M. N.
Demidov, E. V.
Surovegina, E. A.
Shashkin, V. I.
Yunin, P. A.
Butler, J. E.
10TH INTERNATIONAL WORKSHOP 2017 STRONG MICROWAVES AND TERAHERTZ WAVES: SOURCES AND APPLICATIONS, 2017, 149
[46] Effect of Substrate Holder Design on Stress and Uniformity of Large-Area Polycrystalline Diamond Films Grown by Microwave Plasma-Assisted CVD
Sedov, Vadim
Martyanov, Artem
Altakhov, Alexandr
Popovich, Alexey
Shevchenko, Mikhail
Savin, Sergey
Zavedeev, Evgeny
Zanaveskin, Maxim
Sinogeykin, Andrey
Ralchenko, Victor
Konov, Vitaly
COATINGS, 2020, 10 (10) : 1 - 10
[47] OBSERVATION OF SPECTRAL AND NORMAL EMISSIVITY AS A METHOD OF SURFACE CONTROL DURING THE GROWTH OF DIAMOND FILMS DEPOSITED BY A MICROWAVE PLASMA-ASSISTED CVD TECHNIQUE
BARRAT, S
PIGEAT, P
DIEGUEZ, I
BAUERGROSSE, E
WEBER, B
THIN SOLID FILMS, 1995, 263 (02) : 127 - 133
[48] A new type of microwave CVD reactor for diamond depositions
Morel, C
Liehr, M
NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY, 2000, 10 (01): : 33 - 33
[49] Hard coating by plasma-assisted CVD on plasma nitrided stellite
Park, JR
Song, YK
Rie, KT
Gebauer, A
SURFACE & COATINGS TECHNOLOGY, 1998, 98 (1-3): : 1329 - 1335
[50] Hard coating by plasma-assisted CVD on plasma nitrided stellite
Kwangyang Rolling Prod. Res. Team, Technical Research Laboratories, Pohang Iron and Steel Co., Kwangyang, 545-090, Korea, Republic of
不详
不详
不详
Surf. Coat. Technol., 1-3 (1329-1335):

← 1 2 3 4 5 →