Improved contact resistance in ReSe2 thin film field-effect transistors

被引:23
|
作者
Corbet, Chris M. [1 ]
Sonde, Sushant S. [1 ]
Tutuc, Emanuel [1 ]
Banerjee, Sanjay K. [1 ]
机构
[1] Univ Texas Austin, Microelect Res Ctr, 10100 Burnet Rd, Austin, TX 78758 USA
关键词
TRANSITION-METAL DICHALCOGENIDES; FEW-LAYER; INPLANE ANISOTROPY; SEMICONDUCTOR; RHENIUM; PHOTODETECTORS; SPECTROSCOPY; MONOLAYER; GRAPHENE; MOS2;
D O I
10.1063/1.4947468
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report the fabrication and device characteristics of exfoliated, few-layer, ReSe2 field effect transistors (FET) and a method to improve contact resistance by up to three orders of magnitude using ultra-high-vacuum annealing (UHV). Many devices were studied in the absence of light and we found an average contact of 750 Omega . cm after UHV treatment. The median FET metrics were similar to other transition metal dichalcogenides: field effect mobility similar to 6.7 cm(2)/V . s, subthreshold swing similar to 1.2 V/decade, and I-on/I-off similar to 10(5). In devices with low R-c current saturation was observed and is attributed to injection limited transport. Published by AIP Publishing.
引用
收藏
页数:4
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