Chemical stability of polymers under argon gas cluster ion beam and x-ray irradiation

被引：10

作者：

Bernasik, Andrzej ^{[1
,2
]}

Haberko, Jakub ^{[2
]}

Marzec, Mateusz M. ^{[1
]}

Rysz, Jakub ^{[3
]}

Luzny, Wojciech ^{[2
]}

Budkowski, Andrzej ^{[3
]}

机构：

[1] AGH Univ Sci & Technol, Acad Ctr Mat & Nanotechnol, Al Mickiewicza 30, PL-30059 Krakow, Poland

[2] AGH Univ Sci & Technol, Fac Phys & Appl Comp Sci, Al Mickiewicza 30, PL-30059 Krakow, Poland

[3] Jagiellonian Univ, Smoluchowski Inst Phys, Ul Lojasiewicza 11, PL-30348 Krakow, Poland

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2016年 / 34卷 / 03期

关键词：

FILMS;

D O I：

10.1116/1.4943951

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this work, the authors examine chemical stability of polymers under x-ray photoemission spectroscopy (XPS) depth profiling coupled with argon gas cluster ion sputtering. The depth profiles measured for polystyrene, poly(3-dodecylthiophene), and poly(methyl methacrylate) thin films do not reveal changes in the XPS spectra due to cluster bombardment. Nevertheless, x-ray irradiation influences the shape of the sputter craters. The observed features are attributed to cross-linking or chain scission occurring in the polymers. (c) 2016 American Vacuum Society.

引用

页数：5

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