Chemical stability of polymers under argon gas cluster ion beam and x-ray irradiation

被引：10
|
作者：
Bernasik, Andrzej [1 ,2 ]
Haberko, Jakub [2 ]
Marzec, Mateusz M. [1 ]
Rysz, Jakub [3 ]
Luzny, Wojciech [2 ]
Budkowski, Andrzej [3 ]
机构：
[1] AGH Univ Sci & Technol, Acad Ctr Mat & Nanotechnol, Al Mickiewicza 30, PL-30059 Krakow, Poland
[2] AGH Univ Sci & Technol, Fac Phys & Appl Comp Sci, Al Mickiewicza 30, PL-30059 Krakow, Poland
[3] Jagiellonian Univ, Smoluchowski Inst Phys, Ul Lojasiewicza 11, PL-30348 Krakow, Poland
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2016年 / 34卷 / 03期
关键词：
FILMS;
D O I：
10.1116/1.4943951
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In this work, the authors examine chemical stability of polymers under x-ray photoemission spectroscopy (XPS) depth profiling coupled with argon gas cluster ion sputtering. The depth profiles measured for polystyrene, poly(3-dodecylthiophene), and poly(methyl methacrylate) thin films do not reveal changes in the XPS spectra due to cluster bombardment. Nevertheless, x-ray irradiation influences the shape of the sputter craters. The observed features are attributed to cross-linking or chain scission occurring in the polymers. (c) 2016 American Vacuum Society.
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页数：5
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