X-ray absorption studies on cubic boron nitride thin films

被引:5
|
作者
Zhou, X. T. [1 ]
Sham, T. K.
Zhang, W. J.
Chan, C. Y.
Bello, I.
Lee, S. T.
Hofsass, H.
机构
[1] Univ Western Ontario, Dept Chem, London, ON N6A 5B7, Canada
[2] City Univ Hong Kong, COSDAF, Hong Kong, Hong Kong, Peoples R China
[3] City Univ Hong Kong, Dept Phys & Mat Sci, Hong Kong, Hong Kong, Peoples R China
[4] Univ Gottingen, Inst Phys, D-37077 Gottingen, Germany
基金
加拿大自然科学与工程研究理事会;
关键词
D O I
10.1063/1.2405717
中图分类号
O59 [应用物理学];
学科分类号
摘要
Cubic boron nitride (c-BN) films synthesized by various energetic species assisted physical vapor deposition and chemical vapor deposition techniques on Si and diamond-coated Si substrates have been investigated by boron and nitrogen K-edge angle-resolved x-ray absorption near-edge structure in both total electron yield and fluorescence yield modes. X-ray absorption spectrum has been developed to study the film structure, the quantity and distribution of the partially ordered turbostratic (t-BN) and amorphous (a-BN) sp(2)-hybridized BN phases, and the t-BN/a-BN ratios. The preferred direction of the t-BN basal planes at the interface between c-BN and substrate is found to be normal or nearly normal to the substrate. The content of the sp(2)-bonded BN in the c-BN films deposited on diamond-coated Si substrates reduces remarkably. The modifications of the electronic structure of the c-BN films with respect to bulk hexagonal BN and c-BN have been investigated and the crystallinity of c-BN films has also been evaluated from the x-ray absorption near edge structure results. (c) 2007 American Institute of Physics.
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页数:10
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