X-ray absorption and X-ray photoelectron spectroscopic studies of air-oxidized chromium nitride thin films

被引:0
|
作者
Esaka, F
Shimada, H
Imamura, M
Matsubayashi, N
Sato, T
Nishijima, A
Kawana, A
Ichimura, H
Kikuchi, T
Furuya, K
机构
[1] SCI UNIV TOKYO, FAC SCI, DEPT APPL CHEM, SHINJUKU KU, TOKYO 162, JAPAN
[2] SUMITOMO MET MIN CO LTD, ICHIKAWA, CHIBA 272, JAPAN
[3] SCI UNIV TOKYO, ONODA, YAMAGUCHI 756, JAPAN
关键词
nitrides; oxidation; X-ray absorption; X-ray photoelectron spectroscopy;
D O I
10.1016/S0040-6090(96)88640-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The surface oxidation of CrN thin films prepared by the cathode arc ion plating method was studied by X-ray absorption spectroscopy (XAS) and X-ray photoelectron spectroscopy (XPS) using soft X-rays from synchrotron radiation. The results indicate that molecular nitrogen is formed in the interstitial position of the chromium oxide matrix at the initial stage of oxidation. On further oxidation, at a higher temperature, molecular nitrogen is gradually released from the surface, with part of the displaced nitrogen remaining in the interstitial position.
引用
收藏
页码:314 / 317
页数:4
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