共 50 条
- [1] Development of a metrology to characterize EUV optics at 13.5nm PHOTON MANAGEMENT II, 2006, 6187 : U152 - U160
- [2] High-precision multilayer coatings and reflectometry for EUV lithography optics SYNCHROTRON RADIATION INSTRUMENTATION, PTS 1 AND 2, 2007, 879 : 1482 - 1485
- [4] Fabrication and metrology of 10X Schwarzschild optics for EUV imaging ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS, 2004, 5193 : 1 - 10
- [5] Beamline for metrology of x-ray/EUV optics at the advanced light source GRAZING INCIDENCE AND MULTILAYER X-RAY OPTICAL SYSTEMS, 1997, 3113 : 214 - 221
- [6] High reflection optics and high precision metrology for extreme ultraviolet (EUV) light NANOFAIR 2004 NEW IDEAS FOR INDUSTRY, 2004, 1839 : 33 - 36
- [7] Achieving precision radius metrology for large optics LASER FOCUS WORLD, 2014, 50 (04): : 65 - 69
- [8] Characterization of the PTB EUV reflectometry facility for large EUVL optical components EMERGING LITHOGRAPHIC TECHNOLOGIES VII, PTS 1 AND 2, 2003, 5037 : 265 - 273
- [9] Wavefront metrology for EUV projection optics by soft x-ray interferometry in the NewSUBARU SYNCHROTRON RADIATION INSTRUMENTATION, PTS 1 AND 2, 2007, 879 : 1520 - 1523
- [10] High accuracy EUV reflectometry at large optical components and oblique incidence ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES, 2009, 7271