EUV large spectrum reflectometry for the metrology of optics

被引：7
|
作者：
Hecquet, Ch.
Roulliay, M.
Delmotte, F.
Ravet-Krill, M. F.
Hardouin, A.
Idir, M.
Zeitoun, Ph.
机构：
[1] Univ Paris Sud, CNRS, Lab Charles Fabry, Inst Opt, F-91128 Palaiseau, France
[2] Univ Paris 11, Lab Interact Rayonnement X Avec Mat, UMR 8624, CNRS, F-91405 Orsay, France
[3] Synchrotron SOLEIL Orme Merisiers, F-91192 Gif Sur Yvette, France
[4] Ecole Polytech, Lab Opt Appl, ENSTA, F-91761 Palaiseau, France
来源：
JOURNAL DE PHYSIQUE IV | 2006年 / 138卷
关键词：
D O I：
10.1051/jp4:2006138030
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：259 / 264
页数：6
相关论文
共 50 条
  • [31] Characterization of large off-axis EUV mirrors with high accuracy reflectometry at PTB
    Laubis, Christian
    Buchholz, Christian
    Fischer, Andreas
    Ploeger, Sven
    Scholz, Frank
    Wagner, Heike
    Scholze, Frank
    Ulm, Gerhard
    EMERGING LITHOGRAPHIC TECHNOLOGIES X, PTS 1 AND 2, 2006, 6151
  • [32] Massive CD metrology for EUV failure characterization and EPE metrology
    Dillen, Harm
    Chang, Yi-Hsin
    Wang, Fei
    Kea, Marc
    Rispens, Gijsbert
    Kooiman, Marleen
    Wang, Fuming
    Hunsche, Stefan
    Tien, Daniel
    Tang, Peng
    Zhang, Pengcheng
    INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2018, 2018, 10809
  • [33] The Optical CD Metrology for EUV Mask
    Park, Jin-Back
    Bang, Kyoung-Yoon
    Lee, Dong-Gun
    Jeong, Hae-Young
    Kim, Seung-Soo
    Cho, Han-Ku
    PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XVII, 2010, 7748
  • [34] Image contrast metrology for EUV lithography
    Brunner, Timothy A.
    Truffert, Vincent
    Ausschnitt, Christopher
    Kissoon, Nicola N.
    Duriau, Edouard
    Jonckers, Tom
    van Look, Lieve
    Franke, Joern-Holger
    INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2022, 2022, 12292
  • [35] EUV wavefront metrology system in EUVA
    Hasegawa, T
    Ouchi, C
    Hasegawa, M
    Kato, S
    Suzuki, A
    Sugisaki, K
    Murakami, K
    Saito, J
    Niibe, M
    EMERGING LITHOGRAPHIC TECHNOLOGIES VIII, 2004, 5374 : 797 - 807
  • [36] EUV mask blank fabrication & metrology
    Seidel, P
    CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY, 2003, 683 : 371 - 380
  • [37] Lensless metrology for semiconductor lithography at EUV
    Mochi, Iacopo
    Kazazis, Dimitrios
    Tseng, Li-Ting
    Fernandez, Sara
    Rajeev, Rajendran
    Locans, Uldis
    Dejkameh, Atoosa
    Nebling, Ricarda
    Yasin, Ekinci
    MODELING ASPECTS IN OPTICAL METROLOGY VII, 2019, 11057
  • [38] Statistical enhancement of a reflectometry metrology system
    Niu, XH
    Spanos, C
    1997 2ND INTERNATIONAL WORKSHOP ON STATISTICAL METROLOGY, 1997, : 40 - 43
  • [39] Contributions to EUV mask metrology infrastructure
    Farahzadi, Azadeh
    Lebert, Rainer
    Benk, Markus
    Juschkin, Larissa
    Herbert, Stefan
    Maryasov, Aleksey
    26TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE, 2010, 7545
  • [40] Commissioning a laser metrology truss for active optics on the Large Binocular Telescope
    Rakich, Andrew
    Choi, Heejoo
    Veillet, Christian
    Hill, John
    Kuhn, Olga
    Bec, Matthieu
    Zhang, Yang
    Brendel, Trenton
    Sitarski, Breann
    Schoenell, William
    GROUND-BASED AND AIRBORNE TELESCOPES IX, 2022, 12182
12345