Influence of carrier concentration on the resistive switching characteristics of a ZnO-based memristor

被引:37
|
作者
Sun, Yihui [1 ]
Yan, Xiaoqin [1 ]
Zheng, Xin [1 ]
Liu, Yichong [1 ]
Shen, Yanwei [1 ]
Zhang, Yue [1 ,2 ]
机构
[1] Univ Sci & Technol Beijing, Sch Mat Sci & Engn, State Key Lab Adv Met & Mat, Beijing 100083, Peoples R China
[2] Univ Sci & Technol Beijing, Beijing Municipal Key Lab New Energy Mat & Techno, Beijing 100083, Peoples R China
基金
中国国家自然科学基金;
关键词
resistive switch; carrier concentration; driving force; potential gradient; concentration gradient; MEMORY; FILAMENTARY; DEVICE;
D O I
10.1007/s12274-016-1006-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Sandwich-style memristor devices were synthesized by electrochemical deposition with a ZnO film serving as the active layer between Al-doped ZnO (AZO) and Au electrodes. The carrier concentration of the ZnO films is controlled by adding HNO3 during the growth process. A resulting increase in carrier concentration from 10(17) to 10(19) cm(-3) was observed, along with a corresponding drop in the on-off ratio from 6,437% to 100%. The resistive switching characteristics completely disappeared when the carrier concentration was above 10(19) cm(-3), making it unsuitable for a memory device. The decreasing switching ratio is attributed to a reduction in the driving force for oxygen vacancy drift. Systematic analysis of the migration of oxygen vacancies is presented, including the concentration gradient and electrical potential gradient. Such oxygen vacancy migration dynamics provide insight into the mechanisms of the oxygen vacancy drift and provide valuable information for industrial production of memristor devices.
引用
收藏
页码:1116 / 1124
页数:9
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