Effect of carrier screening on ZnO-based resistive switching memory devices

被引:30
|
作者
Sun, Yihui [1 ]
Yan, Xiaoqin [1 ]
Zheng, Xin [1 ]
Li, Yong [1 ]
Liu, Yichong [1 ]
Shen, Yanwei [1 ]
Ding, Yi [1 ]
Zhang, Yue [1 ,2 ]
机构
[1] Univ Sci & Technol Beijing, Sch Mat Sci & Engn, State Key Lab Adv Met & Mat, Beijing 100083, Peoples R China
[2] Univ Sci & Technol Beijing, Beijing Municipal Key Lab New Energy Mat & Techno, Beijing 100083, Peoples R China
基金
中国国家自然科学基金;
关键词
resistive switch; carrier screening effect; carrier concentration; potential gradient; annealing; HIGH-PERFORMANCE; BILAYER STRUCTURE; MEMRISTOR; FILM; DEPOSITION; OXIDE;
D O I
10.1007/s12274-016-1267-7
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The carrier screening effect occurs commonly in dielectric materials. It reduces the electric potential gradient, thus negatively affecting the functionality of resistive random access memory (RRAM) devices. An Au/ZnO film/Al-doped ZnO device fabricated in this work exhibited no resistive switching (RS), which was attributed to the carrier screening effect. Therefore, annealing was used for alleviating the screening effect, significantly enhancing the RS property. In addition, different on/off ratios were obtained for various bias values, and the screening effect was accounted for by investigating electron transport mechanisms. Furthermore, different annealing temperatures were employed to modulate the free carrier concentration in ZnO films to alleviate the screening effect. The maximal on/off ratio reached 10(5) at an annealing temperature of 600 A degrees C, yielding the lowest number of free carriers and the weakest screening effect in ZnO films. This work investigates the screening effect in RS devices. The screening effect not only modulates the characteristics of memory devices but also provides insight into the mechanism of RS in these devices.
引用
收藏
页码:77 / 86
页数:10
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