Optical, electrical and lifetime characterization of in-grown stacking faults in 4H-SiC

被引:0
|
作者
Caldwell, Joshua David [1 ]
Klein, Paul B. [1 ]
Glembocki, Orest J. [1 ]
Stahlbush, Robert E. [1 ]
Liu, Kendrick X. [1 ]
Hobart, Karl D. [1 ]
Kub, Fritz [1 ]
机构
[1] Naval Res Lab, Div Elect Sci & Technol, 4555 Overlook Ave SW, Washington, DC 20375 USA
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Here we present optical beam induced current, electroluminescence, time resolved photoluminescence and current-voltage measurements on several 4H-SiC PiN diodes containing in-grown stacking faults (IGSFs). These defects were observed to act as either current shorts, creating a direct electrical contact between the p+ and n+ layers, or as a current barrier. Carrier lifetime measurements verify that the change in behavior is indeed associated with changes in the conductivity of the material in the vicinity of the defect and not due to local changes in the carrier lifetime. The IGSFs discussed here appear to differ from those previously discussed in the literature and may constitute a new, multi-layered IGSF.
引用
收藏
页码:187 / +
页数:2
相关论文
共 50 条
  • [1] Characterization of major in-grown stacking faults in 4H-SiC epilayers
    Feng, Gan
    Suda, Jun
    Kimoto, Tsunenobu
    [J]. PHYSICA B-CONDENSED MATTER, 2009, 404 (23-24) : 4745 - 4748
  • [2] Optical and Structural Properties of In-grown Stacking Faults in 4H-SiC Epilayers
    Hassan, J.
    Henry, A.
    Bergman, J. P.
    [J]. SILICON CARBIDE AND RELATED MATERIALS 2009, PTS 1 AND 2, 2010, 645-648 : 307 - 310
  • [3] Influence of In-grown Stacking Faults on Electrical Characteristics of 4H-SiC Pin Diode with Long Carrier Lifetime
    Nakayama, K.
    Tanaka, A.
    Asano, K.
    Miyazawa, T.
    Tsuchida, H.
    [J]. SILICON CARBIDE AND RELATED MATERIALS 2012, 2013, 740-742 : 903 - +
  • [4] Structure of in-grown stacking faults in the 4H-SiC epitaxial layers
    Izumi, S
    Tsuchida, H
    Tawara, T
    Kamata, I
    Izumi, K
    [J]. SILICON CARBIDE AND RELATED MATERIALS 2004, 2005, 483 : 323 - 326
  • [5] Structural analysis and reduction of in-grown stacking faults in 4H-SiC epilayers
    Izumi, S
    Tsuchida, H
    Kamata, I
    Tawara, T
    [J]. APPLIED PHYSICS LETTERS, 2005, 86 (20) : 1 - 3
  • [6] In-grown stacking faults identified in 4H-SiC epilayers grown at high growth rate
    Feng, G.
    Suda, J.
    Kimoto, T.
    [J]. SILICON CARBIDE AND RELATED MATERIALS 2009, PTS 1 AND 2, 2010, 645-648 : 287 - 290
  • [7] In-grown stacking faults in 4H-SiC epilayers grown on off-cut substrates
    Hassan, J.
    Henry, A.
    Ivanov, I. G.
    Bergman, J. P.
    [J]. JOURNAL OF APPLIED PHYSICS, 2009, 105 (12)
  • [8] PL Imaging Study of In-Grown Stacking Faults in 4H-SiC Epitaxial Layer
    Hattori, R.
    Shimizu, R.
    Chiba, I.
    Hamano, K.
    Oomori, T.
    [J]. SILICON CARBIDE AND RELATED MATERIALS 2008, 2009, 615-617 : 129 - 132
  • [9] Nucleation of in-grown stacking faults and dislocation half-loops in 4H-SiC epitaxy
    Abadier, M.
    Myers-Ward, R. L.
    Mahadik, N. A.
    Stahlbush, R. E.
    Wheeler, V. D.
    Nyakiti, L. O.
    Eddy, C. R., Jr.
    Gaskill, D. K.
    Song, H.
    Sudarshan, T. S.
    Picard, Y. N.
    Skowronski, M.
    [J]. JOURNAL OF APPLIED PHYSICS, 2013, 114 (12)
  • [10] Examination of In-Grown Stacking Faults in 8°- and 4°-Offcut 4H-SiC Epitaxy by Photoluminescence Imaging
    Kendrick X. Liu
    Robert E. Stahlbush
    Kok-Keong Lew
    Rachael L. Myers-Ward
    Brenda L. VanMil
    Kurt D. Gaskill
    Charles R. Eddy
    [J]. Journal of Electronic Materials, 2008, 37 : 730 - 735