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Pattern Collapse and Particle Removal Forces of Interest to Semiconductor Fabrication Process

被引：4
|
作者：
Kim, Tae-Gon [1 ,2 ]
Wostyn, Kurt [2 ]
Park, Jin-Goo [1 ]
Mertens, Paul W. [2 ]
Busnaina, Ahmed A. [3 ]
机构：
[1] Hanyang Univ, Dept Mat Engn, Ansan 426791, South Korea
[2] IMEC, Kapeldreef 75, B-3001 Heverlee, Belgium
[3] Northeastern University, Center for Microcontamination Contro, Boston, MA 02115 USA
来源：
ULTRA CLEAN PROCESSING OF SEMICONDUCTOR SURFACES IX: UCPSS 2008-9TH INTERNATIONAL SYMPOSIUM ON ULTRA CLEAN PROCESSING OF SEMICONDUCTOR SURFACES (UCPSS) | 2009年 / 145-146卷
基金：
美国国家科学基金会;
关键词：
Pattern Collapse; Particle Removal; Laser Shock Wave Cleaning; SILICON;
D O I：
10.4028/www.scientific.net/SSP.145-146.47
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：47 / +
页数：2
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