High resolution negative i-line resist and process for metal lift-off applications

被引：3
|
作者：
Toukhy, M [1 ]
Mullen, S [1 ]
Lu, PH [1 ]
Neisser, M [1 ]
机构：
[1] Clariant Corp, Somerville, NJ 08876 USA
来源：
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIX, PTS 1 AND 2 | 2002年 / 4690卷
关键词：
D O I：
10.1117/12.474287
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A newly developed, high resolution negative i-line resist product family, is introduced in this paper. Variation in resist film absorption provides optimum inverted sidewall slopes adequate for most metal lift-off applications. Resist resolution below 0.3 mum is demonstrated. The capability of further resolution enhancement with the use of a simple shrink process is also demonstrated.
引用
收藏
页码：846 / 853
页数：8
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