Characterisation of interface-engineered ramp-edge Josephson junctions by transmission electron microscopy

被引：1
|
作者：
Gustafsson, M [1 ]
Olsson, E
Moeckly, B
机构：
[1] Chalmers Univ Technol, S-41296 Gothenburg, Sweden
[2] Uppsala Univ, Angstrom Lab, S-75121 Uppsala, Sweden
[3] Conductus Inc, Sunnyvale, CA 94086 USA
来源：
JOURNAL OF LOW TEMPERATURE PHYSICS | 1999年 / 117卷 / 3-4期
关键词：
D O I：
10.1023/A:1022543800427
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Interface-engineered ramp-edge junctions (IEJ) have been characterised by high-resolution transmission electron microscopy, X-ray analysis and electron energy loss spectroscopy. The IEJ are prepared by plasma etching an ion-milled YBa2Cu3O7-delta (YBCO) ramp-edge and subsequently a top YBCO layer is deposited. The results show that the YBCO at the plasma-etched interface has a modified structure. The modified barrier structure has a pseudo cubic unit cell which is rotated 45 degrees around the [001] axis with respect to the underlying YBCO.
引用
收藏
页码：581 / 585
页数：5
相关论文
共 50 条
  • [31] The effect of process parameters on the electrical properties of ramp-edge Josephson junctions with modified interfaces
    Horibe, M
    Inagaki, Y
    Yoshida, K
    Matsuda, G
    Hayashi, N
    Fujimaki, A
    Hayakawa, H
    ADVANCES IN SUPERCONDUCTIVITY XII, 2000, : 996 - 998
  • [32] Reproducibility and controllability of critical current for ramp-edge interface-modified junctions
    Horibe, M
    Ito, T
    Inagaki, Y
    Ohnishi, K
    Matsuda, G
    Yoshinaga, Y
    Maruyama, A
    Fujimaki, A
    Hayakawa, H
    PHYSICA C, 2001, 357 (SUPPL. 1): : 1424 - 1427
  • [33] 'Interface-engineered' high-Tc Josephson junctions:: a possible mechanism of operation
    Tinchev, SS
    SUPERCONDUCTOR SCIENCE & TECHNOLOGY, 1999, 12 (09): : L5 - L7
  • [34] Composition analysis of modified layer in YBCO trilayer interface-engineered Josephson junctions
    Sugimata, E
    Fujino, H
    Kume, E
    Sakai, S
    PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS, 2004, 412 : 1419 - 1423
  • [35] Fabrication of ramp-edge josephson junctions using LnBCO superconductors (Ln = Yb, Y and Sm)
    Adachi, Seiji
    Wakana, Hironori
    Tanabe, Keiichi
    PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS, 2007, 460 (1365-1366): : 1365 - 1366
  • [36] Preparation of multilayer films for integrated high-Tc SQUIDs with ramp-edge Josephson junctions
    Adachi, S.
    Hata, K.
    Sugano, T.
    Wakana, H.
    Hato, T.
    Tarutani, Y.
    Tanabe, K.
    PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS, 2008, 468 (15-20): : 1936 - 1941
  • [37] Ramp-edge Josephson junctions made of Pr2-xCexCuO4±δ electrodes and barriers
    Roberge, G.
    Charpentier, S.
    Godin-Proulx, S.
    Fournier, P.
    JOURNAL OF APPLIED PHYSICS, 2011, 109 (07)
  • [38] Polishing in fabrication of superconducting circuits with ramp-edge junctions
    Hato, T
    Harada, N
    Yoshida, A
    Ishimaru, Y
    Tarutani, Y
    Tanabe, K
    Yokoyama, N
    PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS, 2002, 378 : 1343 - 1347
  • [39] Influence of circuit pattern layout on characteristics of interface-modified ramp-edge junctions
    Wakana, Hironori
    Adachi, Seiji
    Tsubone, Koji
    Tarutani, Yoshinobu
    Nakayama, Kohei
    Oshikubo, Yasuo
    Tanabe, Keiichi
    IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY, 2007, 17 (02) : 229 - 232
  • [40] Evaluation of fabrication process and barrier structure for interface-modified ramp-edge junctions
    Ishimaru, Y
    Wu, Y
    Horibe, O
    Tano, H
    Suzuki, T
    Yoshida, Y
    Horibe, M
    Wakana, H
    Adachi, S
    Takahashi, Y
    Oshikubo, Y
    Sugiyama, H
    Iiyama, M
    Tarutani, Y
    Tanabe, K
    PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS, 2002, 378 : 1327 - 1333
12345