Studying extreme ultraviolet

被引：0
|
作者：
不详
机构：
来源：
IEEE MICRO | 1997年 / 17卷 / 05期
关键词：
D O I：
暂无
中图分类号：
TP3 [计算技术、计算机技术];
学科分类号：
0812 ;
摘要：
引用
收藏
页码：6 / 6
页数：1
相关论文
共 50 条
  • [21] POLARIZERS FOR EXTREME ULTRAVIOLET
    HUNTER, WR
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1965, S 4 : 520 - &
  • [22] EXTREME ULTRAVIOLET SPECTROHELIOMETER
    UNDERWOO.JH
    MANGUS, JD
    NEUPERT, WM
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1969, 59 (04) : 514 - &
  • [23] Analyses in extreme ultraviolet
    Wolff, K
    ANNALEN DER PHYSIK, 1913, 42 (14) : 825 - 839
  • [24] THE EXTREME ULTRAVIOLET EXPLORER
    MALINA, RF
    BOWYER, S
    LAMPTON, M
    FINLEY, D
    PARESCE, F
    PENEGOR, G
    HEETDERKS, H
    OPTICAL ENGINEERING, 1982, 21 (04) : 764 - 768
  • [25] Extreme ultraviolet catastrophes
    Eleftherios Goulielmakis
    Nature Photonics, 2012, 6 : 142 - 143
  • [26] Extreme ultraviolet lithography
    Gwyn, CW
    Stulen, R
    Sweeney, D
    Attwood, D
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06): : 3142 - 3149
  • [27] Measurement of resist transmittance at extreme ultraviolet wavelength using the extreme ultraviolet reflectometer
    Irie, Shigeo
    Endo, Masayuki
    Sasago, Masaru
    Kandaka, Noriaki
    Kondo, Hiroyuki
    Murakami, Katsuhiko
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2002, 41 (6 A): : 4027 - 4030
  • [28] Observation of Phase defect on Extreme Ultraviolet Mask Using an Extreme Ultraviolet Microscope
    Amano, Tsuyoshi
    Terasawa, Tsuneo
    Watanabe, Hidehiro
    Toyoda, Mitsunori
    Harada, Tetsuo
    Watanabe, Takeo
    Kinoshita, Hiroo
    EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY V, 2014, 9048
  • [29] Resolution enhancement of extreme ultraviolet microscope using an extreme ultraviolet beam splitter
    Osugi, Masafumi
    Tanaka, Kazuumi
    Sakaya, Noriyuki
    Hamamoto, Kazuhiro
    Watanabe, Takeo
    Kinoshita, Hiroo
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (06) : 4872 - 4877
  • [30] Transmission Measurement Using Extreme Ultraviolet Light for the Development of Extreme Ultraviolet Resist
    Ohnishi, Ryuji
    Watanabe, Takeo
    Fukushima, Yasuyuki
    Osugi, Masafumi
    Kinoshita, Hiroo
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2009, 48 (06) : 06FA081 - 06FA084
12345