Studying extreme ultraviolet

被引：0
|
作者：
不详
机构：
来源：
IEEE MICRO | 1997年 / 17卷 / 05期
关键词：
D O I：
暂无
中图分类号：
TP3 [计算技术、计算机技术];
学科分类号：
0812 ;
摘要：
引用
收藏
页码：6 / 6
页数：1
相关论文
共 50 条
  • [11] Extreme ultraviolet lithography
    Sandia Natl Lab, Livermore, United States
    Opt Photonics News, 8 (35-38):
  • [12] SPECTROHELIOGRAMS IN EXTREME ULTRAVIOLET
    PURCELL, JD
    GARRETT, DL
    TOUSEY, R
    ASTRONOMICAL JOURNAL, 1964, 69 (02): : 147 - &
  • [13] An extreme ultraviolet spectrometer
    Didkovsky, LV
    Judge, DL
    Jones, AR
    Sensors and Camera Systems for Scientific and Industrial Applications VI, 2005, 5677 : 141 - 152
  • [14] MIRRORS FOR THE EXTREME ULTRAVIOLET
    SPILLER, E
    AIP CONFERENCE PROCEEDINGS, 1984, (119) : 312 - 323
  • [15] THE EXTREME ULTRAVIOLET EXPLORER
    BOWYER, S
    MALINA, R
    LAMPTON, M
    FINLEY, D
    PARESCE, F
    PENEGOR, G
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1981, 279 : 176 - 182
  • [16] Extreme ultraviolet explorer
    Bowyer, S.
    Malina, R.F.
    European Space Agency, (Special Publication) ESA SP, 1990, (310):
  • [17] MONOCHROMATOR FOR EXTREME ULTRAVIOLET
    JAKLEVIC, RC
    LEBLANC, LJ
    JUENKER, DW
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1967, 38 (11): : 1597 - &
  • [18] DETECTORS IN EXTREME ULTRAVIOLET
    WARNER, DA
    OSER, GT
    MCCORMICK, WW
    SAWYER, RA
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1967, 57 (11) : 1362 - +
  • [19] A comb in the extreme ultraviolet
    Linda Young
    Nature, 2012, 482 : 45 - 46
  • [20] Extreme ultraviolet lithography
    Wallen, Hayley
    NATURE REVIEWS METHODS PRIMERS, 2024, 4 (01):
12345