Single crystal growth of 3C-SiC on 15R-SiC

被引:0
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作者
Nakamura, S [1 ]
Hatayama, T [1 ]
Nishino, K [1 ]
Kimoto, T [1 ]
Matsunami, H [1 ]
机构
[1] Kyoto Univ, Dept Elect Sci & Engn, Sakyo Ku, Kyoto 6068501, Japan
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O4 [物理学];
学科分类号
0702 ;
摘要
Single crystalline 3C-SiC has been grown on 15R-SiC substrates up to 60 mum of thickness. A single domain region with a size of more than 2 mm x 2 mm was obtained. The full width at half maximum in X-ray theta - 2theta method was 20 see. In low-temperature photoluminescence of grown layer, sharp peaks near the band edge are dominant and free exciton peaks were observed up to 130 K. This suggests high purity of the 3C-SiC epilayer on 15R-SiC.
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页码:717 / 722
页数:6
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