GaN/AlGaN high electron mobility transistors with fτ of 110GHz

被引:91
|
作者
Micovic, M [1 ]
Nguven, NX [1 ]
Janke, P [1 ]
Wong, WS [1 ]
Hashimoto, P [1 ]
McCray, LM [1 ]
Nguyen, C [1 ]
机构
[1] HRL Labs LLC, Malibu, CA 90265 USA
关键词
D O I
10.1049/el:20000296
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The performance of 50nm gate length GaN/AlGaN HEMTs is reported. The device layers were grown by MBE directly onto an SiC substrate. Devices exhibit a maximum drain current density of 1.2A/mm. an extrinsic f(tau) of 110GHz and an f(max) of over 140GHz. The f(tau), of 110GHz is the highest reported to date for a GaN/AlGaN HEMT, a nearly 50% increase over the previous record.
引用
收藏
页码:358 / 359
页数:2
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