P-channel differential multiple-time programmable memory cells by laterally coupled floating metal gate fin field-effect transistors

被引:0
|
作者
Wang, Tai-Min [1 ]
Chien, Wei-Yu [1 ]
Hsu, Chia-Ling [1 ]
Lin, Chrong Jung [1 ]
King, Ya-Chin [1 ]
机构
[1] Natl Tsing Hua Univ, Inst Elect Engn, Microelect Lab, Hsinchu 300, Taiwan
关键词
MTP MEMORY; LOGIC; NVM;
D O I
10.7567/JJAP.57.04FE14
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this paper, we present a new differential p-channel multiple-time programmable (MTP) memory cell that is fully compatible with advanced 16 nm CMOS fin field-effect transistors (FinFET) logic processes. This differential MTP cell stores complementary data in floating gates coupled by a slot contact structure, which make different read currents possible on a single cell. In nanoscale CMOS FinFET logic processes, the gate dielectric layer becomes too thin to retain charges inside floating gates for nonvolatile data storage. By using a differential architecture, the sensing window of the cell can be extended and maintained by an advanced blanket boost scheme. The charge retention problem in floating gate cells can be improved by periodic restoring lost charges when significant read window narrowing occurs. In addition to high programming efficiency, this p-channel MTP cells also exhibit good cycling endurance as well as disturbance immunity. The blanket boost scheme can remedy the charge loss problem under thin gate dielectrics. (C) 2018 The Japan Society of Applied Physics.
引用
收藏
页数:4
相关论文
共 50 条
  • [41] Analysis of an anomalous hump in gate current after dynamic negative bias stress in HfxZr1-xO2/metal gate p-channel metal-oxide-semiconductor field-effect transistors
    Ho, Szu-Han
    Chang, Ting-Chang
    Wu, Chi-Wei
    Lo, Wen-Hung
    Chen, Ching-En
    Tsai, Jyun-Yu
    Luo, Hung-Ping
    Tseng, Tseung-Yuen
    Cheng, Osbert
    Huang, Cheng-Tung
    Sze, Simon M.
    [J]. APPLIED PHYSICS LETTERS, 2012, 101 (05)
  • [42] Investigation of an anomalous hump in gate current after negative-bias temperature-instability in HfO2/metal gate p-channel metal-oxide-semiconductor field-effect transistors
    Ho, Szu-Han
    Chang, Ting-Chang
    Wu, Chi-Wei
    Lo, Wen-Hung
    Chen, Ching-En
    Tsai, Jyun-Yu
    Liu, Guan-Ru
    Chen, Hua-Mao
    Lu, Ying-Shin
    Wang, Bin-Wei
    Tseng, Tseung-Yuen
    Cheng, Osbert
    Huang, Cheng-Tung
    Sze, Simon M.
    [J]. APPLIED PHYSICS LETTERS, 2013, 102 (01)
  • [43] Effect of Nitrogen Concentration on Low-Frequency Noise and Negative Bias Temperature Instability of p-Channel Metal-Oxide-Semiconductor Field-Effect Transistors with Nitrided Gate Oxide
    Han, In-Shik
    Kwon, Hyuk-Min
    Bok, Jung-Deuk
    Kwon, Sung-Kyu
    Jung, Yi-Jung
    Choi, Woon-il
    Choi, Deuk-Sung
    Lim, Min-Gyu
    Chung, Yi-Sun
    Lee, Jung-Hwan
    Lee, Ga-Won
    Lee, Hi-Deok
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (10)
  • [44] Effect of the oxidation process on the electrical characteristics of 4H-SiC p-channel metal-oxide-semiconductor field-effect transistors
    Kamoto, Mitsuo
    Tanaka, Mieko
    Yatsuo, Tsutomu
    Fukuda, Kenji
    [J]. APPLIED PHYSICS LETTERS, 2006, 89 (02)
  • [45] The study on mechanism and model of negative bias temperature instability degradation in P-channel metal-oxide-semiconductor field-effect transistors
    曹艳荣
    马晓华
    郝跃
    田文超
    [J]. Chinese Physics B, 2010, 19 (09) : 568 - 573
  • [46] InGaSb-on-insulator p-channel metal-oxide-semiconductor field-effect transistors on Si fabricated by direct wafer bonding
    Yokoyama, Masafumi
    Yokoyama, Haruki
    Takenaka, Mitsuru
    Takagi, Shinichi
    [J]. JOURNAL OF APPLIED PHYSICS, 2019, 125 (11)
  • [47] Processing dependences of channel hot-carrier degradation on strained-Si p-channel metal-oxide semiconductor field-effect transistors
    Amat, E.
    Martin-Martinez, J.
    Gonzalez, M. B.
    Rodriguez, R.
    Nafria, M.
    Aymerich, X.
    Verheyen, P.
    Simoen, E.
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2011, 29 (01):
  • [48] Low temperature mobility in hafnium-oxide gated germanium p-channel metal-oxide-semiconductor field-effect transistors
    Beer, Chris
    Whall, Terry
    Parker, Evan
    Leadley, David
    De Jaeger, Brice
    Nicholas, Gareth
    Zimmerman, Paul
    Meuris, Marc
    Szostak, Slawomir
    Gluszko, Grzegorz
    Lukasiak, Lidia
    [J]. APPLIED PHYSICS LETTERS, 2007, 91 (26)
  • [49] The study on mechanism and model of negative bias temperature instability degradation in P-channel metal-oxide-semiconductor field-effect transistors
    Cao Yan-Rong
    Ma Xiao-Hua
    Hao Yue
    Tian Wen-Chao
    [J]. CHINESE PHYSICS B, 2010, 19 (09)
  • [50] Experimental and Analytical Characterization of Dual-Gated Germanium Junctionless p-Channel Metal-Oxide-Semiconductor Field-Effect Transistors
    Zhao, Dan Dan
    Lee, Choong Hyun
    Nishimura, Tomonori
    Nagashio, Kosuke
    Cheng, Guo An
    Toriumi, Akira
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2012, 51 (04)