Development of high-vacuum planar magnetron sputtering using an advanced magnetic field geometry

被引：2

作者：

Ohno, Takahiro ^{[1
]}

Yagyu, Daisuke ^{[1
]}

Saito, Shigeru ^{[1
]}

Ohno, Yasunori ^{[1
]}

Nakano, Hirofumi ^{[2
]}

Itoh, Masatoshi ^{[1
]}

Uhara, Yoshio ^{[1
]}

Miura, Tsutomu ^{[1
]}

机构：

[1] Tokyo Univ Sci, Fac Engn, Dept Elect Engn, Katsushika Ku, Tokyo 1258585, Japan

[2] Ikazuti Ltd, Chofu, Tokyo 1820007, Japan

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2015年 / 33卷 / 06期

关键词：

DISCHARGE;

D O I：

10.1116/1.4927442

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A permanent magnet in a new magnetic field geometry (namely, with the magnetization in the radial direction) was fabricated and used for high-vacuum planar magnetron sputtering using Penning discharge. Because of the development of this magnet, the discharge current and deposition rate were increased two to three times in comparison with the values attainable with a magnet in the conventional geometry. This improvement was because the available space for effective discharge of the energetic electrons for the ionization increased because the magnetic field distribution increased in both the axial and radial directions of discharge. (C) 2015 American Vacuum Society.

引用

页数：4

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