A dc I-V model for short-channel polygonal enclosed-layout transistors

被引:2
|
作者
Lopez, Paula [1 ]
Hauer, Johann [2 ]
Blanco-Filgueira, Beatriz [1 ]
Cabello, Diego [1 ]
机构
[1] Univ Santiago de Compostela, Dept Elect & Comp Sci, Santiago De Compostela 15782, Spain
[2] Fraunhofer Inst Integrierte Schaltungen, D-91058 Erlangen, Germany
关键词
enclosed-layout transistors (ELT); radiation-hardness; modelling; deep submicron CMOS; short-channel effects; MOSFETS;
D O I
10.1002/cta.537
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Despite the demonstrated radiation immunity of gate-enclosed layout transistors in deep submicron CMOS technologies, there is a significant lack of a thorough theoretical study addressing fundamental design issues on this kind of transistors. In this paper we propose a physical dc I-V model for short-channel polygonal-shape enclosed-layout transistors in both the linear and saturation regions of operation accounting for second-order effects such as depletion region non-uniformity, carrier velocity and channel length modulation. The impact of this layout style on the driving capability of the devices is also investigated. Experimental results based upon a fabricated NMOS test chip containing these devices in a standard 0.18 mu m CMOS technology process are presented. The comparison of the theoretical prediction with the experimental data show close agreement. Copyright (C) 2008 John Wiley & Sons, Ltd.
引用
收藏
页码:163 / 177
页数:15
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