A dc I-V model for short-channel polygonal enclosed-layout transistors

被引:2
|
作者
Lopez, Paula [1 ]
Hauer, Johann [2 ]
Blanco-Filgueira, Beatriz [1 ]
Cabello, Diego [1 ]
机构
[1] Univ Santiago de Compostela, Dept Elect & Comp Sci, Santiago De Compostela 15782, Spain
[2] Fraunhofer Inst Integrierte Schaltungen, D-91058 Erlangen, Germany
关键词
enclosed-layout transistors (ELT); radiation-hardness; modelling; deep submicron CMOS; short-channel effects; MOSFETS;
D O I
10.1002/cta.537
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Despite the demonstrated radiation immunity of gate-enclosed layout transistors in deep submicron CMOS technologies, there is a significant lack of a thorough theoretical study addressing fundamental design issues on this kind of transistors. In this paper we propose a physical dc I-V model for short-channel polygonal-shape enclosed-layout transistors in both the linear and saturation regions of operation accounting for second-order effects such as depletion region non-uniformity, carrier velocity and channel length modulation. The impact of this layout style on the driving capability of the devices is also investigated. Experimental results based upon a fabricated NMOS test chip containing these devices in a standard 0.18 mu m CMOS technology process are presented. The comparison of the theoretical prediction with the experimental data show close agreement. Copyright (C) 2008 John Wiley & Sons, Ltd.
引用
收藏
页码:163 / 177
页数:15
相关论文
共 50 条
  • [31] EFFECTS OF SOURCE/DRAIN IMPLANTS ON SHORT-CHANNEL MOSFET-I-V AND C-V CHARACTERISTICS
    HUANG, CL
    KHALIL, NA
    ARORA, ND
    ZETTERLUND, B
    BAIR, LA
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1995, 42 (07) : 1255 - 1261
  • [32] Analytical drain current and threshold voltage model and device design of short-channel Si nanowire transistors
    Tanaka, Chika
    Hagishima, Daisuke
    Uchida, Ken
    Numata, Toshinori
    [J]. SOLID-STATE ELECTRONICS, 2013, 86 : 27 - 31
  • [33] PHYSICAL MODEL OF THRESHOLD VOLTAGE IN SILICON MOS-TRANSISTORS INCLUDING REVERSE SHORT-CHANNEL EFFECT
    BRUT, H
    JUGE, A
    GHIBAUDO, G
    [J]. ELECTRONICS LETTERS, 1995, 31 (05) : 411 - 412
  • [34] A Compact Subthreshold Model for Short-Channel Monolayer Transition Metal Dichalcogenide Field-Effect Transistors
    You, Wei-Xiang
    Su, Pin
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2016, 63 (07) : 2971 - 2974
  • [35] Analytical model for threshold voltage and I-V characteristics of fully depleted short channel cylindrical/surrounding gate MOSFET
    Kranti, A
    Haldar, S
    Gupta, RS
    [J]. MICROELECTRONIC ENGINEERING, 2001, 56 (3-4) : 241 - 259
  • [36] Improved empirical DC I-V model for 4H-SiC MESFETs
    CAO QuanJun
    [J]. Science China(Information Sciences), 2008, (08) : 1184 - 1192
  • [37] An Improved Nonlinear DC I-V Characteristics Model for Nanometer Range GaAs MESFETs
    Islam, M. S.
    Islam, Muhymin
    Hasan, Mohammad Raziul
    Islam, S. M. Naeemul
    [J]. TENCON 2009 - 2009 IEEE REGION 10 CONFERENCE, VOLS 1-4, 2009, : 941 - 945
  • [38] Improved empirical DC i-v model for 4H-SiC MESFETs
    Cao QuanJun
    Zhang YiMen
    Zhang YuMing
    Lv HongLiang
    Wang YueHu
    Tang XiaoYan
    Guo Hui
    [J]. SCIENCE IN CHINA SERIES F-INFORMATION SCIENCES, 2008, 51 (08): : 1184 - 1192
  • [39] GaN HEMT DC I-V Device Model for Accurate RF Rectifier Simulation
    Yasui, Tsukasa
    Ishikawa, Ryo
    Honjo, Kazuhiko
    [J]. IEEE MICROWAVE AND WIRELESS COMPONENTS LETTERS, 2017, 27 (10) : 930 - 932
  • [40] An Explicit Physics-Based I-V Model for Surrounding-Gate Polysilicon Transistors
    Yu, Fei
    Deng, Wanling
    Huang, Junkai
    Ma, Xiaoyu
    Chen, Songlin
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2016, 63 (03) : 1059 - 1065