M3D-ADTCO: Monolithic 3D Architecture, Design and Technology Co-Optimization for High Energy Efficient 3D IC

被引:0
|
作者
Thuries, Sebastien [1 ]
Billoint, Olivier [1 ]
Choisnet, Sylvain [1 ]
Lemaire, Romain [1 ]
Vivet, Pascal [1 ]
Batude, Perrine [1 ]
Lattard, Didier [1 ]
机构
[1] Univ Grenoble Alpes, CEA Leti MINATEC Campus, Grenoble, France
基金
欧盟地平线“2020”;
关键词
Monolithic 3D (M3D); Signoff Design Flow & Methodologies; CAD Tools; Process Design Kit;
D O I
10.23919/date48585.2020.9116293
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
Monolithic 30 (M3D) stands now as the ultimate technology to side step Moore's Law stagnation. Due to its nanoscale Monolithic Inter-tier Via (MIV), M3D enables an ultra-high density interconnect between Logic and Memory that is required in the field of highly energy efficient 3D integrated circuits (3D-ICs) designed for new abundant data computing systems. At design level, M3D still suffers from a lack of commercial tools, especially for Place and Route, precluding the capability to provide signoff Al3D GDS. In this paper, we introduce M3D-ADTCO, an architecture, design and technology co-optimization platform aimed at providing signoff M3D GDS. It relies on a M3D Process Design Kit and the use of a commercial Place and Route tool. We demonstrate an area reduction of 23.61'g at iso performance and power compared to a 2D RISC-V micro-controller based System on Chip (SoC) while creating space to increase (2x) the RISC-V instruction memory.
引用
收藏
页码:1740 / 1745
页数:6
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