Recovery behavior of high purity cubic SiC polycrystals by post-irradiation annealing up to 1673 K after low temperature neutron irradiation

被引:14
|
作者
Idris, Mohd Idzat [1 ,3 ]
Yamazaki, Saishun [2 ]
Yoshida, Katsumi [2 ]
Yano, Toyohiko [2 ]
机构
[1] Tokyo Inst Technol, Grad Sch Sci & Engn, Dept Nucl Engn, Meguro Ku, Tokyo 1528550, Japan
[2] Tokyo Inst Technol, Nucl Reactors Res Lab, Meguro Ku, Tokyo 1528550, Japan
[3] Natl Univ Malaysia, Sch Appl Phys, Fac Sci & Technol, Bangi Selangor 43600, Malaysia
关键词
Silicon carbide; Neutron irradiation; Recovery behavior; Activation energy; FUEL PERFORMANCE; DEFECTS;
D O I
10.1016/j.jnucmat.2015.07.046
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Two kinds of high purity cubic (beta) SiC polycrystals, PureBeta-SiC and CVD-SiC, were irradiated in the BR2 reactor (Belgium) up to a fluence of 2.0-2.5 x 10(24) (E > 0.1 MeV) at 333-363 K. Changes in macroscopic lengths were examined by post-irradiation thermal annealing using a precision dilatometer up to 1673 K with a step-heating method. The specimen was held at each temperature step for 6 h and the change in length of the specimen was recorded during each isothermal annealing step from 373 K to 1673 K with 50 K increments. The recovery curves were analyzed with the first order model, and rate constants at each annealing step were obtained. Recovery of defects, induced by neutron irradiation in high purity beta-SiC, has four stages of different activation energies. At 373-573 K, the activation energy of PureBeta-SiC and CVD-SiC was in the range of 0.17-0.24 eV and 0.12-0.14 eV; 0.002-0.04 eV and 0.006-0.04 eV at 723-923 K; 0.20-0.27 eV and 0.26-031 eV at 923-1223 K; and 137-1.38 eV and 1.26-1.29 eV at 1323 -1523 K, respectively. Below similar to 1223 K the recombination occurred possibly for closely positioned C and Si Frenkel pairs, and no long range migration is deemed essential. Nearly three-fourths of recovery, induced by neutron irradiation, occur by this mechanism. In addition, at 1323-1523 K, recombination of slightly separated C Frenkel pairs and more long-range migration of Si interstitials may have occurred for PureBeta-SiC and CVD-SiC specimens. Migration of both vacancies may be restricted up to -1523 K. Comparing to hexagonal alpha-Sic high purity beta-SiC recovered more quickly in the lower annealing temperature range of less than 873 K, in particular less than 573 K. (C) 2015 Elsevier B.V. All rights reserved.
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页码:814 / 819
页数:6
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