Recovery behavior of high purity cubic SiC polycrystals by post-irradiation annealing up to 1673 K after low temperature neutron irradiation

被引:14
|
作者
Idris, Mohd Idzat [1 ,3 ]
Yamazaki, Saishun [2 ]
Yoshida, Katsumi [2 ]
Yano, Toyohiko [2 ]
机构
[1] Tokyo Inst Technol, Grad Sch Sci & Engn, Dept Nucl Engn, Meguro Ku, Tokyo 1528550, Japan
[2] Tokyo Inst Technol, Nucl Reactors Res Lab, Meguro Ku, Tokyo 1528550, Japan
[3] Natl Univ Malaysia, Sch Appl Phys, Fac Sci & Technol, Bangi Selangor 43600, Malaysia
关键词
Silicon carbide; Neutron irradiation; Recovery behavior; Activation energy; FUEL PERFORMANCE; DEFECTS;
D O I
10.1016/j.jnucmat.2015.07.046
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Two kinds of high purity cubic (beta) SiC polycrystals, PureBeta-SiC and CVD-SiC, were irradiated in the BR2 reactor (Belgium) up to a fluence of 2.0-2.5 x 10(24) (E > 0.1 MeV) at 333-363 K. Changes in macroscopic lengths were examined by post-irradiation thermal annealing using a precision dilatometer up to 1673 K with a step-heating method. The specimen was held at each temperature step for 6 h and the change in length of the specimen was recorded during each isothermal annealing step from 373 K to 1673 K with 50 K increments. The recovery curves were analyzed with the first order model, and rate constants at each annealing step were obtained. Recovery of defects, induced by neutron irradiation in high purity beta-SiC, has four stages of different activation energies. At 373-573 K, the activation energy of PureBeta-SiC and CVD-SiC was in the range of 0.17-0.24 eV and 0.12-0.14 eV; 0.002-0.04 eV and 0.006-0.04 eV at 723-923 K; 0.20-0.27 eV and 0.26-031 eV at 923-1223 K; and 137-1.38 eV and 1.26-1.29 eV at 1323 -1523 K, respectively. Below similar to 1223 K the recombination occurred possibly for closely positioned C and Si Frenkel pairs, and no long range migration is deemed essential. Nearly three-fourths of recovery, induced by neutron irradiation, occur by this mechanism. In addition, at 1323-1523 K, recombination of slightly separated C Frenkel pairs and more long-range migration of Si interstitials may have occurred for PureBeta-SiC and CVD-SiC specimens. Migration of both vacancies may be restricted up to -1523 K. Comparing to hexagonal alpha-Sic high purity beta-SiC recovered more quickly in the lower annealing temperature range of less than 873 K, in particular less than 573 K. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:814 / 819
页数:6
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