Measuring modulus of Young's low-k dielectrics using surface acoustic waves

被引：0
|
作者：
Gostein, M [1 ]
Mazurenko, A
Maznev, AA
Schulberg, MT
机构：
[1] Philips AMS, Austin, TX USA
[2] Philips AMS, Natick, MA USA
[3] Novellus Syst, Corp Res & Dev Grp, San Jose, CA USA
来源：
MICRO | 2004年 / 22卷 / 05期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A rapid, nondestructive technique can be used to characterize the stiffness of thin films, map coated-wafer contours, and detect the elastic anisotropy of porous dielectric materials.
引用
收藏
页码：51 / +
页数：9
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