Measuring modulus of Young's low-k dielectrics using surface acoustic waves

被引：0

作者：

Gostein, M ^{[1
]}

Mazurenko, A

Maznev, AA

Schulberg, MT

机构：

[1] Philips AMS, Austin, TX USA

[2] Philips AMS, Natick, MA USA

[3] Novellus Syst, Corp Res & Dev Grp, San Jose, CA USA

来源：

MICRO | 2004年 / 22卷 / 05期

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A rapid, nondestructive technique can be used to characterize the stiffness of thin films, map coated-wafer contours, and detect the elastic anisotropy of porous dielectric materials.

引用

页码：51 / +

页数：9

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