Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennas

被引：9
|
作者：
Kunkemoeller, Georg [1 ,2 ,3 ,4 ]
Mass, Tobias W. W. [5 ]
Michel, Ann-Katrin U. [5 ]
Kim, Hyun-Su [3 ]
Brose, Sascha [1 ,2 ]
Danylyuk, Serhiy [1 ,2 ]
Taubner, Thomas [5 ]
Juschkin, Larissa [3 ,4 ]
机构：
[1] Rhein Westfal TH Aachen, Chair Technol Opt Syst, D-52074 Aachen, Germany
[2] JARA, Fundamentals Future Informat Technol JARA FIT, D-52074 Aachen, Germany
[3] Rhein Westfal TH Aachen, JARA FIT, Chair Expt Phys EUV, D-52074 Aachen, Germany
[4] Forschungszentrum Julich, JARA FIT, Peter Grunberg Inst PGI 9, D-52425 Julich, Germany
[5] Rhein Westfal TH Aachen, Inst Phys IA, D-52056 Aachen, Germany
来源：
OPTICS EXPRESS | 2015年 / 23卷 / 20期
关键词：
HIGH-THROUGHPUT NANOFABRICATION; SURFACE-PLASMON RESONANCE; NANOANTENNA ARRAYS; RAMAN-SPECTROSCOPY; METAMATERIALS;
D O I：
10.1364/OE.23.025487
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We present a method for fabrication of large arrays of nano-antennas using extreme-ultraviolet (EUV) illumination. A discharge-produced plasma source generating EUV radiation around 10.88 nm wavelength is used for the illumination of a photoresist via a mask in a proximity printing setup. The method of metallic nanoantennas fabrication utilizes a bilayer photoresist and employs a lift-off process. The impact of Fresnel-diffraction of EUV light in the mask on a shape of the nanostructures has been investigated. It is shown how by the use of the same rectangular apertures in the transmission mask, antennas of various shapes can be fabricated. Using Fourier transform infrared spectroscopy, spectra of antennas reflectivity were measured and compared to FDTD simulations demonstrating good agreement. (C) 2015 Optical Society of America
引用
收藏
页码：25487 / 25495
页数：9
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