Defect-free fabrication of periodic structures using extreme ultraviolet Talbot lithography

被引：0
|
作者：
Li, W. [1 ,2 ]
Martinez-Esquiroz, V. [1 ,2 ]
Urbanski, L. [1 ,2 ]
Patel, D. [1 ,2 ]
Menoni, C. S. [1 ,2 ]
Marconi, M. C. [1 ,2 ]
Stein, A. [3 ]
机构：
[1] Colorado State Univ, Engn Res Ctr Extreme Ultraviolet Sci & Technol, Ft Collins, CO 80523 USA
[2] Colorado State Univ, Elect & Comp Engn Dept, Ft Collins, CO 80523 USA
[3] Brookhaven Natl Lab, Ctr Funct Nanomat, Upton, NY 11973 USA
来源：
2013 IEEE PHOTONICS CONFERENCE (IPC) | 2013年
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We present a defect-free scalable nano-patterning scheme based on the Talbot effect with extreme ultraviolet laser illumination.
引用
收藏
页码：635 / 636
页数：2
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