Dynamics of mass-limited laser plasma targets as sources for extreme ultraviolet lithography

被引：4
|
作者：
Keyser, C [1 ]
Bernath, R
Al-Rabban, M
Richardson, M
机构：
[1] Univ Cent Florida, Sch Opt, Orlando, FL 32816 USA
[2] Univ Cent Florida, CREOL, Orlando, FL 32816 USA
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2002年 / 41卷 / 6B期
关键词：
laser plasma; EUV lithography; water droplet target;
D O I：
10.1143/JJAP.41.4070
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The droplet laser plasma source has many attractive features as a continuous, almost debris-free source for extreme ultraviolet (EUV) and X-ray radiation applications. In a combined experimental and theoretical study, we are analyzing the interaction physics between the laser light and microscopic spherical liquid droplet targets over a range of conditions.
引用
收藏
页码：4070 / 4073
页数：4
相关论文
共 50 条
  • [41] Lifetime Calculations on Collector Optics from Laser Plasma Extreme Ultraviolet Sources with Minimum Mass
    Wu Tao
    Wang Xin-Bing
    CHINESE PHYSICS LETTERS, 2011, 28 (05)
  • [42] Laser produced plasma for efficient extreme ultraviolet light sources
    Donnelly, Tony
    Cummins, Thomas
    Gorman, Colm O'
    Li, Bowen
    Harte, Colm S.
    O'Reilly, Fergal
    Sokell, Emma
    Dunne, Padraig
    O'Sullivan, Gerry
    17TH INTERNATIONAL CONFERENCE ON ATOMIC PROCESSES IN PLASMAS (ICAPIP), 2012, 1438 : 155 - 160
  • [43] Laser-produced plasma light source development for extreme ultraviolet lithography
    Komori, Hiroshi
    Soumagne, Georg
    Abe, Tamotsu
    Suganuma, Takashi
    Imai, Yousuke
    Someya, Hiroshi
    Takabayashi, Yuichi
    Endo, Akira
    Toyoda, Koichi
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2004, 43 (6 B): : 3707 - 3712
  • [44] Laser-produced-plasma light source development for extreme ultraviolet lithography
    Komori, H
    Abe, T
    Suganuma, T
    Imai, Y
    Sugimoto, Y
    Someya, H
    Hoshino, H
    Soumagne, G
    Takabayashi, Y
    Mizoguchi, H
    Endo, A
    Toyoda, K
    Horiike, Y
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (06): : 2843 - 2847
  • [45] Laser-produced plasma light source development for extreme ultraviolet lithography
    Komori, H
    Soumagne, G
    Abe, T
    Suganuma, T
    Imai, Y
    Someya, H
    Takabayashi, Y
    Endo, A
    Toyoda, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2004, 43 (6B): : 3707 - 3712
  • [46] Extreme ultraviolet plasma source for future lithography
    Wagenaars, Erik
    Mader, Arnaud
    Bergmann, Klaus
    Jonkers, Jeroen
    Neff, Willi
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2008, 36 (04) : 1280 - 1281
  • [47] Enhanced laser ion acceleration from mass-limited foils
    Kluge, T.
    Enghardt, W.
    Kraft, S. D.
    Schramm, U.
    Zeil, K.
    Cowan, T. E.
    Bussmann, M.
    PHYSICS OF PLASMAS, 2010, 17 (12)
  • [48] Colliding laser-produced plasmas as targets for laser-generated extreme ultraviolet sources
    Cummins, T.
    O'Gorman, C.
    Dunne, P.
    Sokell, E.
    O'Sullivan, G.
    Hayden, P.
    APPLIED PHYSICS LETTERS, 2014, 105 (04)
  • [49] Ion energy spectrum and magnetic foil trap debris mitigation efficiency of the laser produced plasma sources for extreme ultraviolet lithography
    Wu Tao
    Wang Shifang
    Rao Zhiming
    PHOTONICS AND OPTOELECTRONICS MEETINGS (POEM) 2011: LASER AND TERAHERTZ SCIENCE AND TECHNOLOGY, 2012, 8330
  • [50] Laser-Induced Plasma Exposure on Extreme Ultraviolet Lithography Masks: Damage Analysis
    Varghese, Ivin
    Cetinkaya, Cetin
    IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2012, 25 (04) : 630 - 637
12345