Dynamics of mass-limited laser plasma targets as sources for extreme ultraviolet lithography

被引：4
|
作者：
Keyser, C [1 ]
Bernath, R
Al-Rabban, M
Richardson, M
机构：
[1] Univ Cent Florida, Sch Opt, Orlando, FL 32816 USA
[2] Univ Cent Florida, CREOL, Orlando, FL 32816 USA
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2002年 / 41卷 / 6B期
关键词：
laser plasma; EUV lithography; water droplet target;
D O I：
10.1143/JJAP.41.4070
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The droplet laser plasma source has many attractive features as a continuous, almost debris-free source for extreme ultraviolet (EUV) and X-ray radiation applications. In a combined experimental and theoretical study, we are analyzing the interaction physics between the laser light and microscopic spherical liquid droplet targets over a range of conditions.
引用
收藏
页码：4070 / 4073
页数：4
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