Mass-limited, debris-free laser-plasma EUV source

被引：0
|
作者：
Univ of Central Florida, Orlando, United States [1 ]
机构：
来源：
Opt Commun | / 1-6卷 / 109-112期
关键词：
The authors acknowledge useful discussions with Drs. G. Kubiak; A; Hawryluk; F. Zernicke and W.T. Silfvast; and thank Dr. J. Underwood for multilayer mirror samples; Dr. D. Kania for an X-ray diode; Dr. C. Brown for X-ray film digitization; and J. Cormier; G. Luntz and M. Nguyen for technical support. This work was supported by ARPA through contract (LLNL) B3 13948; and the State of Florida;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
20
引用
收藏
相关论文
共 50 条
  • [1] Mass-limited, debris-free laser-plasma EUV source
    Richardson, M
    Torres, D
    DePriest, C
    Jin, F
    Shimkaveg, G
    OPTICS COMMUNICATIONS, 1998, 145 (1-6) : 109 - 112
  • [2] Diagnostic technique of gas jet for debris-free laser-plasma EUV source
    Bobashev, SV
    de Bruijn, R
    Kopytova, TG
    Kurakin, YA
    Schmidt, AA
    Stepanova, ZA
    Tumakaev, GK
    EMERGING LITHOGRAPHIC TECHNOLOGIES IV, 2000, 3997 : 777 - 783
  • [3] A debris-free laser-plasma source using ice droplets
    Richardson, M
    Torres, D
    DePriest, C
    Jin, F
    Shimkaveg, G
    APPLICATIONS OF X RAYS GENERATED FROM LASERS AND OTHER BRIGHT SOURCES, 1997, 3157 : 306 - 309
  • [4] DEBRIS-FREE SINGLE-LINE LASER-PLASMA X-RAY SOURCE FOR MICROSCOPY
    RYMELL, L
    BERGLUND, M
    HERTZ, HM
    APPLIED PHYSICS LETTERS, 1995, 66 (20) : 2625 - 2627
  • [5] Development of Debris-free Laser Plasma Sources for EUV Lithography in CIOMP
    CHEN Bo
    NI Qi liang
    CAO Jian lin (State Key Laboratory of Applied Optics
    Changchun Institute of Optics
    Fine Mechanics and Physics
    Chinese Academy of Sciences
    Changchun 130022
    China)
    光学精密工程 , 2001, (05) : 442 - 445
  • [6] Compact debris-free EUV source for advanced mirror metrology
    Egbert, A
    Tkachenko, B
    Becker, S
    Chichkov, BN
    ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS II, 2004, 5533 : 1 - 9
  • [7] Production of Sn-droplets as a target of laser-produced plasma for debris-free EUV light source
    Tamaru, Koji
    Nakamura, Daisuke
    Takahasi, Akihiro
    Okada, Tatsuo
    2007 PACIFIC RIM CONFERENCE ON LASERS AND ELECTRO-OPTICS, VOLS 1-4, 2007, : 738 - 739
  • [8] Liquid target for debris-free laser-plasma soft x-ray generation
    Rymell, L
    Berglund, M
    Malmqvist, L
    Hertz, HM
    X-RAY LASERS 1996, 1996, (151): : 472 - 474
  • [9] Debris studies for the tin-based droplet laser-plasma EUV source
    Takenoshita, K
    Koay, CS
    Teerawattanasook, S
    Richardson, M
    EMERGING LITHOGRAPHIC TECHNOLOGIES VIII, 2004, 5374 : 954 - 963
  • [10] Debris-Free EUV Source using a through-hole tin target
    Ueno, Y
    Aota, T
    Niimi, G
    Lee, DH
    Nishigori, K
    Yashiro, H
    Tomie, T
    EMERGING LITHOGRAPHIC TECHNOLOGIES VII, PTS 1 AND 2, 2003, 5037 : 750 - 758
12345