Challenges in detecting and analyzing process-induced damage for 130nm CMOS technology and beyond

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作者：
Aum, P
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2002 7TH INTERNATIONAL SYMPOSIUM ON PLASMA- AND PROCESS-INDUCED DAMAGE | 2002年
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TM [电工技术]; TN [电子技术、通信技术];
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0808 ; 0809 ;
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页码：31 / 36
页数：6
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