Direct E-Beam writing of electro-optic polymer channel waveguides

被引:0
|
作者
Belardini, A [1 ]
Larciprete, MC [1 ]
Cianci, E [1 ]
Foglietti, V [1 ]
Ratsimihety, A [1 ]
Rousseau, A [1 ]
Michelotti, F [1 ]
机构
[1] Univ Roma La Sapienza, Dipartimento Energet, I-00161 Rome, Italy
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中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The possibility to use electron-beam writing on an electro-optic cross-linkable polymer film deposited on a Si/SiO2 substrate is investigated. Both positive and negative electron-beam writings have been performed, with different exposure doses. Good resolution and a depth of 30 nm was obtained in the positive case, while in the negative case a lower resolution was obtained and a depth of 580 run. With negative writing we fabricated test channel waveguides of good optical quality.
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页码:427 / 428
页数:2
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