Direct E-Beam writing of electro-optic polymer channel waveguides

被引：0
|
作者：
Belardini, A [1 ]
Larciprete, MC [1 ]
Cianci, E [1 ]
Foglietti, V [1 ]
Ratsimihety, A [1 ]
Rousseau, A [1 ]
Michelotti, F [1 ]
机构：
[1] Univ Roma La Sapienza, Dipartimento Energet, I-00161 Rome, Italy
来源：
MICRORESONATORS AS BUILDING BLOCKS FOR VLSI PHOTONICS | 2004年 / 709卷
关键词：
D O I：
暂无
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The possibility to use electron-beam writing on an electro-optic cross-linkable polymer film deposited on a Si/SiO2 substrate is investigated. Both positive and negative electron-beam writings have been performed, with different exposure doses. Good resolution and a depth of 30 nm was obtained in the positive case, while in the negative case a lower resolution was obtained and a depth of 580 run. With negative writing we fabricated test channel waveguides of good optical quality.
引用
收藏
页码：427 / 428
页数：2
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