Transmission gate-based 9T SRAM cell for variation resilient low power and reliable internet of things applications

被引:31
|
作者
Pal, Soumitra [1 ]
Gupta, Vivek [2 ]
Ki, Wing Hung [1 ]
Islam, Aminul [2 ]
机构
[1] Hong Kong Univ Sci & Technol, Dept Elect & Comp Engn, Clear Water Bay, Hong Kong, Peoples R China
[2] Birla Inst Technol, Dept Elect & Commun Engn, Ranchi 835215, Jharkhand, India
关键词
CMOS memory circuits; leakage currents; SRAM chips; low-power electronics; Internet of Things; transmission gate-based 9T SRAM; SRAM cell; variation resilient low power; principal design metrics; voltage scaling; conventional 6T SRAM; power dissipation; power consumption; static random-access memory cell; nanometre technology nodes; data stability; deep-subthreshold regime; read decoupling; complementary metal oxide semiconductor model; size; 16; nm; NEGATIVE BIT-LINE; SUBTHRESHOLD SRAM; NOISE MARGIN; WRITE OPERATION; DESIGN; SCHEME; READ; FINFET; ARRAY;
D O I
10.1049/iet-cds.2018.5283
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Higher variation resilience, lower power consumption, and higher reliability are the three principal design metrics for designing a static random-access memory (SRAM) cell. The most intuitive way to achieve lower power consumption is voltage scaling. However, voltage scaling at nanometre technology nodes leads to degradation in the robustness of the SRAM cell and decreased data stability. It is proved that conventional 6T SRAM fails to maintain its stability in scaled technology, particularly in the deep-subthreshold regime. Furthermore, SRAM cells utilising techniques such as read decoupling, for achieving reliable read operation, tend to increase leakage current resulting in higher hold power, which contributes a major portion to the total power consumption in modern internet of things devices. To cater to the requirements of higher robustness and lower hold power dissipation, a transmission gate-based 9T SRAM is proposed, which achieves these requirements at the cost of slightly higher read and write access time. The simulations are performed utilising a 16-nm complementary metal oxide semiconductor model.
引用
收藏
页码:584 / 595
页数:12
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